Issued Patents 2017
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9733395 | Microlithographic projection exposure apparatus | Vladimir Kamenov, Toralf Gruner, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel +3 more | 2017-08-15 |
| 9645503 | Collector | Ingo Saenger, Joerg Zimmermann, Johannes Ruoff, Martin Meier, Frank Schlesener +2 more | 2017-05-09 |
| 9551941 | Illumination system for an EUV lithography device and facet mirror therefor | Johannes Ruoff, Ingo Saenger, Joerg Zimmermann, Christoph Hennerkes, Frank Schlesener | 2017-01-24 |
| 9535332 | Mask for EUV lithography, EUV lithography system and method for optimising the imaging of a mask | Johannes Ruoff | 2017-01-03 |