Issued Patents 2017
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9817317 | Optical system of a microlithographic projection exposure apparatus | Frank Schlesener | 2017-11-14 |
| 9798249 | Method and apparatus for compensating at least one defect of an optical system | Vladimir Dmitriev, Frank Schlesener, Markus Mengel, Johannes Ruoff | 2017-10-24 |
| 9678432 | Optical assembly for increasing the etendue | Christoph Hennerkes | 2017-06-13 |
| 9678439 | Mirror | Johannes Ruoff, Martin Endres, Thomas Eisenmann | 2017-06-13 |
| 9665008 | Mirror system comprising at least one mirror for use for guiding illumination and imaging light in EUV projection lithography | Frank Schlesener | 2017-05-30 |
| 9645503 | Collector | Joerg Zimmermann, Daniel Kraehmer, Johannes Ruoff, Martin Meier, Frank Schlesener +2 more | 2017-05-09 |
| 9632413 | Apparatus and method for compensating a defect of a channel of a microlithographic projection exposure system | Frank Schlesener | 2017-04-25 |
| 9588433 | Optical system, in particular of a microlithographic projection exposure apparatus | — | 2017-03-07 |
| 9581910 | Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus | Frank Schlesener, Olaf Dittmann, Aksel Goehnermeier, Alexandra Pazidis, Thomas Schicketanz +2 more | 2017-02-28 |
| 9551941 | Illumination system for an EUV lithography device and facet mirror therefor | Johannes Ruoff, Joerg Zimmermann, Daniel Kraehmer, Christoph Hennerkes, Frank Schlesener | 2017-01-24 |