Issued Patents 2017
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9817317 | Optical system of a microlithographic projection exposure apparatus | Ingo Saenger | 2017-11-14 |
| 9798249 | Method and apparatus for compensating at least one defect of an optical system | Vladimir Dmitriev, Ingo Saenger, Markus Mengel, Johannes Ruoff | 2017-10-24 |
| 9753375 | Illumination optical unit for projection lithography | Axel Scholz, Michael Patra, Manfred Maul, Wolfgang Emer, Stefanie Hilt | 2017-09-05 |
| 9703205 | Measuring an optical symmetry property on a projection exposure apparatus | Jens Timo Neumann | 2017-07-11 |
| 9703206 | Method for operating an illumination system of a microlithographic projection exposure apparatus | Oliver Natt | 2017-07-11 |
| 9665008 | Mirror system comprising at least one mirror for use for guiding illumination and imaging light in EUV projection lithography | Ingo Saenger | 2017-05-30 |
| 9645503 | Collector | Ingo Saenger, Joerg Zimmermann, Daniel Kraehmer, Johannes Ruoff, Martin Meier +2 more | 2017-05-09 |
| 9632413 | Apparatus and method for compensating a defect of a channel of a microlithographic projection exposure system | Ingo Saenger | 2017-04-25 |
| 9606441 | Illumination system for microlithography | Axel Scholz, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler +8 more | 2017-03-28 |
| 9581910 | Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus | Ingo Saenger, Olaf Dittmann, Aksel Goehnermeier, Alexandra Pazidis, Thomas Schicketanz +2 more | 2017-02-28 |
| 9551941 | Illumination system for an EUV lithography device and facet mirror therefor | Johannes Ruoff, Ingo Saenger, Joerg Zimmermann, Daniel Kraehmer, Christoph Hennerkes | 2017-01-24 |