Issued Patents 2017
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9851641 | Illumination system for an EUV projection lithographic projection exposure apparatus | — | 2017-12-26 |
| 9841683 | Illumination optical unit for EUV projection lithography | — | 2017-12-12 |
| 9823577 | Facet mirror for a projection exposure apparatus | Markus Deguenther | 2017-11-21 |
| 9823571 | EUV light source for a lighting device of a microlithographic projection exposure apparatus | — | 2017-11-21 |
| 9791784 | Assembly for a projection exposure apparatus for EUV projection lithography | Stig Bieling, Markus Deguenther, Johannes Wangler | 2017-10-17 |
| 9791785 | Method for assigning a pupil facet of a pupil facet mirror of an illumination optical unit of a projection exposure apparatus to a field facet of a field facet mirror of the illumination optical unit | — | 2017-10-17 |
| 9753375 | Illumination optical unit for projection lithography | Axel Scholz, Frank Schlesener, Manfred Maul, Wolfgang Emer, Stefanie Hilt | 2017-09-05 |
| 9678438 | Illumination system of a microlithographic projection exposure apparatus | Markus Schwab | 2017-06-13 |
| 9671699 | Illumination system of a microlithographic projection exposure apparatus | — | 2017-06-06 |
| 9645501 | Illumination optical unit for EUV projection lithography, and optical system comprising such an illumination optical unit | Markus Deguenther | 2017-05-09 |
| 9612540 | Method of operating a microlithographic apparatus | — | 2017-04-04 |
| 9612537 | Illumination optical unit for EUV projection lithography | — | 2017-04-04 |
| 9599904 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Erich Schubert, Alexander Kohl, Gerhard-Wilhelm Ziegler, Markus Deguenther, Michael Layh | 2017-03-21 |
| 9581910 | Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus | Frank Schlesener, Ingo Saenger, Olaf Dittmann, Aksel Goehnermeier, Alexandra Pazidis +2 more | 2017-02-28 |
| 9563129 | Monitor system for determining orientations of mirror elements and EUV lithography system | Johannes Wangler, Johannes Eisenmenger, Markus Deguenther | 2017-02-07 |
| 9535331 | Optical system for a microlithographic projection exposure apparatus | Johannes Eisenmenger, Markus Schwab | 2017-01-03 |