Issued Patents 2017
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9563129 | Monitor system for determining orientations of mirror elements and EUV lithography system | Johannes Wangler, Markus Deguenther, Michael Patra | 2017-02-07 |
| 9535331 | Optical system for a microlithographic projection exposure apparatus | Michael Patra, Markus Schwab | 2017-01-03 |