Issued Patents 2017
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9791784 | Assembly for a projection exposure apparatus for EUV projection lithography | Michael Patra, Stig Bieling, Markus Deguenther | 2017-10-17 |
| 9575414 | Illumination system for a microlithographic projection exposure apparatus | Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul, Markus Deguenther +4 more | 2017-02-21 |
| 9563129 | Monitor system for determining orientations of mirror elements and EUV lithography system | Johannes Eisenmenger, Markus Deguenther, Michael Patra | 2017-02-07 |