Issued Patents 2017
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9746778 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Gero Wittich, Timo Laufer, Peter Kuerz +7 more | 2017-08-29 |
| 9703206 | Method for operating an illumination system of a microlithographic projection exposure apparatus | Frank Schlesener | 2017-07-11 |
| 9568845 | Mirror for use in a microlithography projection exposure apparatus | Martin Rocktaeschel, Hartmut Enkisch, Franz-Josef Stickel, Hans-Juergen Mann, Sascha Migura | 2017-02-14 |