Issued Patents 2017
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9746778 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Peter Kuerz +7 more | 2017-08-29 |
| 9639007 | Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus | Alexander Sauerhoefer | 2017-05-02 |