UL

Ulrich Loering

CG Carl Zeiss Smt Gmbh: 2 patents #47 of 237Top 20%
AB Asml Netherlands B.V.: 1 patents #199 of 568Top 40%
📍 Ulm, DE: #10 of 99 inventorsTop 15%
Overall (2017): #96,385 of 506,227Top 20%
2
Patents 2017

Issued Patents 2017

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
9746778 EUV exposure apparatus with reflective elements having reduced influence of temperature variation Norman Baer, Oliver Natt, Gero Wittich, Timo Laufer, Peter Kuerz +7 more 2017-08-29
9671703 Optical arrangement, EUV lithography apparatus and method for configuring an optical arrangement Norman Baer, Toralf Gruner 2017-06-06