Issued Patents 2017
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9746778 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer, Peter Kuerz +7 more | 2017-08-29 |
| 9671703 | Optical arrangement, EUV lithography apparatus and method for configuring an optical arrangement | Toralf Gruner, Ulrich Loering | 2017-06-06 |
| 9575224 | Mirror, projection objective with such mirror, and projection exposure apparatus for microlithography with such projection objective | Rolf Freimann, Guido Limbach, Thure Boehm, Gero Wittich | 2017-02-21 |