GW

Gero Wittich

CG Carl Zeiss Smt Gmbh: 2 patents #47 of 237Top 20%
AB Asml Netherlands B.V.: 1 patents #199 of 568Top 40%
Overall (2017): #151,783 of 506,227Top 30%
2
Patents 2017

Issued Patents 2017

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
9746778 EUV exposure apparatus with reflective elements having reduced influence of temperature variation Norman Baer, Ulrich Loering, Oliver Natt, Timo Laufer, Peter Kuerz +7 more 2017-08-29
9575224 Mirror, projection objective with such mirror, and projection exposure apparatus for microlithography with such projection objective Rolf Freimann, Norman Baer, Guido Limbach, Thure Boehm 2017-02-21