Issued Patents 2017
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9785052 | Optical system of a microlithographic projection exposure apparatus and method of reducing image placement errors | Johannes Ruoff, Joerg Zimmermann, Dirk Hellweg, Dirk Juergens | 2017-10-10 |
| 9703205 | Measuring an optical symmetry property on a projection exposure apparatus | Frank Schlesener | 2017-07-11 |