Issued Patents 2016
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9523923 | Illumination system of a microlithographic projection exposure apparatus | — | 2016-12-20 |
| 9500954 | Illumination system of a microlithographic projection exposure apparatus | Vladimir Davydenko, Thomas Korb, Frank Schlesener, Stefanie Hilt, Wolfgang Hoegele | 2016-11-22 |
| 9494483 | Measuring system for measuring an imaging quality of an EUV lens | Ralf Frese, Michael Samaniego, Helmut Haidner, Rainer Hoch, Martin Schriever | 2016-11-15 |
| 9477157 | Illumination system of a microlithographic projection exposure apparatus | Michael Patra, Stig Bieling, Frank Schlesener, Markus Schwab | 2016-10-25 |
| 9454085 | Illumination system of a microlithographic projection exposure apparatus | Damian Fiolka, Gerhard-Wilhelm Ziegler | 2016-09-27 |
| 9448490 | EUV lithography system | Udo Dinger, Lars Wischmeier, Markus Hauf, Stephan Kellner, Igor Gurevich | 2016-09-20 |
| 9423686 | Mask for microlithography and scanning projection exposure method utilizing the mask | Michael Patra | 2016-08-23 |
| 9377415 | Measuring device for measuring an illumination property | Michael Arnz | 2016-06-28 |
| 9341953 | Microlithographic illumination system | Michael Layh, Michael Gerhard, Bruno Thome, Wolfgang Singer | 2016-05-17 |
| 9316772 | Producing polarization-modulating optical element for microlithography system | Damian Fiolka | 2016-04-19 |
| 9310694 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Erich Schubert, Alexander Kohl, Gerhard-Wilhelm Ziegler, Michael Patra, Michael Layh | 2016-04-12 |
| 9310690 | Illumination system of a microlithographic projection exposure apparatus | Vladimir Davydenko, Thomas Korb, Frank Schlesener, Stefanie Hilt, Wolfgang Hoegele | 2016-04-12 |
| 9280055 | Illumination system of a microlithographic projection exposure apparatus | Michael Patra | 2016-03-08 |
| 9280060 | Illumination system for microlithography | Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard +8 more | 2016-03-08 |
| 9239229 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2016-01-19 |