Issued Patents 2016
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9448490 | EUV lithography system | Lars Wischmeier, Markus Hauf, Stephan Kellner, Igor Gurevich, Markus Deguenther | 2016-09-20 |
| 9442383 | EUV-mirror arrangement, optical system with EUV-mirror arrangement and associated operating method | Frederik Bijkerk, Muharrem Bayraktar, Oliver Dier | 2016-09-13 |
| 9444214 | Beam guidance system for the focusing guidance of radiation from a high-power laser light source toward a target and LPP X-ray source comprising a laser light source and such a beam guidance system | — | 2016-09-13 |
| 9411241 | Facet mirror for use in a projection exposure apparatus for microlithography | Martin Endres, Armin Werber, Norbert Muehlberger, Florian Bach | 2016-08-09 |