Issued Patents 2016
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9411241 | Facet mirror for use in a projection exposure apparatus for microlithography | Udo Dinger, Armin Werber, Norbert Muehlberger, Florian Bach | 2016-08-09 |
| 9341958 | Deflection mirror and projection exposure apparatus for microlithography comprising such a deflection mirror | Hartmut Enkisch, Stephan Muellender | 2016-05-17 |
| 9310692 | Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus | Ralf Stuetzle, Jens Ossmann, Michael Layh | 2016-04-12 |
| 9304400 | Illumination system for EUV microlithography | Michael Layh, Ralf Stuetzle, Damian Fiolka, Holger Weigand | 2016-04-05 |
| 9304406 | Field facet mirror for an illumination optics of a projection exposure apparatus for EUV microlithography | Adrian Staicu | 2016-04-05 |
| 9304408 | Projection objective for microlithography | Johannes Zellner, Hans-Juergen Mann | 2016-04-05 |