Issued Patents 2016
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9310692 | Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus | Martin Endres, Jens Ossmann, Michael Layh | 2016-04-12 |
| 9304400 | Illumination system for EUV microlithography | Michael Layh, Damian Fiolka, Martin Endres, Holger Weigand | 2016-04-05 |
| 9235137 | Illumination optical unit for microlithography | Damian Fiolka | 2016-01-12 |