Issued Patents 2016
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9454085 | Illumination system of a microlithographic projection exposure apparatus | Markus Deguenther, Gerhard-Wilhelm Ziegler | 2016-09-27 |
| 9423590 | Liquid cooled EUV reflector | Joachim Hartjes, Boaz Pnini-Mittler | 2016-08-23 |
| 9383544 | Optical system for semiconductor lithography | Frank Melzer, Yim-Bun Patrick Kwan, Stefan Xalter | 2016-07-05 |
| 9316772 | Producing polarization-modulating optical element for microlithography system | Markus Deguenther | 2016-04-19 |
| 9316920 | Illumination system of a microlithographic projection exposure apparatus with a birefringent element | Daniel Walldorf, Ingo Saenger | 2016-04-19 |
| 9304400 | Illumination system for EUV microlithography | Michael Layh, Ralf Stuetzle, Martin Endres, Holger Weigand | 2016-04-05 |
| 9304405 | Microlithography illumination system and microlithography illumination optical unit | Michael Totzeck, Hartmut Enkisch, Stephan Muellender | 2016-04-05 |
| 9274435 | Illumination system or projection objective of a microlithographic projection exposure apparatus | Nils Dieckmann | 2016-03-01 |
| 9239229 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2016-01-19 |
| 9235137 | Illumination optical unit for microlithography | Ralf Stuetzle | 2016-01-12 |