Issued Patents 2016
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9383544 | Optical system for semiconductor lithography | Frank Melzer, Yim-Bun Patrick Kwan, Damian Fiolka | 2016-07-05 |
| 9316930 | Low-contamination optical arrangement | Yim-Bun Patrick Kwan | 2016-04-19 |
| 9298111 | Optical arrangement in a projection exposure apparatus for EUV lithography | Viktor Kulitzki, Bernhard Gellrich, Yim-Bun Patrick Kwan, Peter Deufel, Andreas Wurmbrand | 2016-03-29 |
| 9239229 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka +6 more | 2016-01-19 |