Issued Patents 2016
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9477092 | Optical imaging arrangement with individually actively supported components | — | 2016-10-25 |
| 9436101 | Optical arrangement and microlithographic projection exposure apparatus including same | Armin Schoeppach, Hans-Juergen Mann, Frank Eisert | 2016-09-06 |
| 9383544 | Optical system for semiconductor lithography | Frank Melzer, Stefan Xalter, Damian Fiolka | 2016-07-05 |
| 9366976 | Optical element with low surface figure deformation | — | 2016-06-14 |
| 9316930 | Low-contamination optical arrangement | Stefan Xalter | 2016-04-19 |
| 9316929 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more | 2016-04-19 |
| 9298111 | Optical arrangement in a projection exposure apparatus for EUV lithography | Viktor Kulitzki, Bernhard Gellrich, Stefan Xalter, Peter Deufel, Andreas Wurmbrand | 2016-03-29 |
| 9239229 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka +6 more | 2016-01-19 |