TL

Timo Laufer

CG Carl Zeiss Smt Gmbh: 2 patents #48 of 219Top 25%
AB Asml Netherlands B.V.: 1 patents #204 of 517Top 40%
Overall (2016): #91,876 of 481,213Top 20%
2
Patents 2016

Issued Patents 2016

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
9383328 Lithography apparatus 2016-07-05
9316929 EUV exposure apparatus with reflective elements having reduced influence of temperature variation Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Peter Kuerz +7 more 2016-04-19