Issued Patents 2016
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9494718 | Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective | Joern WEBER, Wilfried Clauss, Hans-Jochen Paul, Gerhard Braun, Sascha Migura +4 more | 2016-11-15 |
| 9341958 | Deflection mirror and projection exposure apparatus for microlithography comprising such a deflection mirror | Hartmut Enkisch, Martin Endres | 2016-05-17 |
| 9304405 | Microlithography illumination system and microlithography illumination optical unit | Damian Fiolka, Michael Totzeck, Hartmut Enkisch | 2016-04-05 |
| 9285515 | Imaging optical system and projection exposure system including the same | Hans-Juergen Mann, Wilheim Ulrich, Hartmut Enkisch | 2016-03-15 |