Issued Patents 2016
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9494718 | Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective | Stephan Muellender, Joern WEBER, Hans-Jochen Paul, Gerhard Braun, Sascha Migura +4 more | 2016-11-15 |
| 9459538 | Lithography apparatus and method for producing a mirror arrangement | Dirk Schaffer, Hin Yiu Anthony Chung | 2016-10-04 |
| 9263161 | Optical arrangement for EUV lithography and method for configuring such an optical arrangement | — | 2016-02-16 |
| 9238590 | Mirror elements for EUV lithography and production methods therefor | — | 2016-01-19 |