MH

Markus Hauf

CG Carl Zeiss Smt Gmbh: 4 patents #16 of 219Top 8%
AB Asml Netherlands B.V.: 1 patents #204 of 517Top 40%
📍 Ulm, CA: #1 of 2 inventorsTop 50%
Overall (2016): #39,128 of 481,213Top 9%
4
Patents 2016

Issued Patents 2016

Showing 1–4 of 4 patents

Patent #TitleCo-InventorsDate
9448490 EUV lithography system Udo Dinger, Lars Wischmeier, Stephan Kellner, Igor Gurevich, Markus Deguenther 2016-09-20
9442397 Device for controlling temperature of an optical element 2016-09-13
9316929 EUV exposure apparatus with reflective elements having reduced influence of temperature variation Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more 2016-04-19
9298101 Multi facet mirror of a microlithographic projection exposure apparatus Thorsten Rassel 2016-03-29