Issued Patents All Time
Showing 26–50 of 71 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11417500 | Plasma processing apparatus and plasma processing method | Junichi Sasaki, Hidetoshi Hanaoka, Tomohiko Akiyama | 2022-08-16 |
| 11133759 | Electrostatic chuck, substrate processing apparatus, and substrate holding method | — | 2021-09-28 |
| 11037815 | Dechuck control method and plasma processing apparatus | Katsunori Hirai, Junichi Sasaki | 2021-06-15 |
| 11004717 | Plasma processing apparatus and plasma processing method | Shoichiro Matsuyama, Daiki Satoh, Takashi Nishijima, Jinyoung Park | 2021-05-11 |
| 10910252 | Plasma processing apparatus | Akira Ishikawa, Ryo CHIBA | 2021-02-02 |
| 10886108 | Power feed structure and plasma processing apparatus | Yohei Uchida | 2021-01-05 |
| 10879050 | Plasma processing apparatus, electrostatic attraction method, and electrostatic attraction program | Shoichiro Matsuyama, Naoki Tamaru | 2020-12-29 |
| 10832930 | Electrostatic attraction method | Katsunori Hirai | 2020-11-10 |
| 10825709 | Electrostatic chucking method and substrate processing apparatus | Taketoshi TOMIOKA, Hiroki Kishi, Jisoo SUH | 2020-11-03 |
| 10591194 | Temperature control method | Kazuyoshi Matsuzaki | 2020-03-17 |
| 10541158 | Temperature adjustment method using wet surface in a processing chamber | Eiichiro Kikuchi, Kazuyoshi Matsuzaki | 2020-01-21 |
| 10410902 | Plasma processing apparatus | Akihito Fushimi | 2019-09-10 |
| 10388558 | Plasma processing apparatus | Akira Ishikawa, Ryo CHIBA | 2019-08-20 |
| 10269607 | Electrostatic chucking method and substrate processing apparatus | Taketoshi TOMIOKA, Hiroki Kishi, Jisoo SUH | 2019-04-23 |
| 10141164 | Plasma processing apparatus and plasma processing method | Akihito Fushimi, Manabu Iwata | 2018-11-27 |
| 9953854 | Method of adsorbing target object on mounting table and plasma processing apparatus | Akihito Fushimi | 2018-04-24 |
| D803802 | Electrostatic chuck for semiconductor manufacturing equipment | Tomoyuki Takahashi | 2017-11-28 |
| D802472 | Electrostatic chuck for semiconductor manufacturing equipment | Tomoyuki Takahashi | 2017-11-14 |
| 9791191 | Temperature control apparatus, processing apparatus, and temperature control method | Kazuyoshi Matsuzaki | 2017-10-17 |
| D795208 | Electrostatic chuck for semiconductor manufacturing equipment | Tomoyuki Takahashi | 2017-08-22 |
| 9721822 | Electrostatic chuck apparatus | Kenji Masuzawa, Toshiyuki MAKABE, Mamoru Kosakai, Takashi Satou, Kazunori Ishimura +2 more | 2017-08-01 |
| 9589823 | Mounting table and plasma processing apparatus | Takeshi Sugamata, Tadashi Aoto | 2017-03-07 |
| 9484232 | Zone temperature control structure | — | 2016-11-01 |
| 9484180 | Plasma processing method and plasma processing apparatus | Manabu Iwata | 2016-11-01 |
| 9412635 | Electrostatic chuck device | Kaoru Oohashi, Tomoyuki Takahashi, Tadashi Aoto, Mamoru Kosakai, Shinichi Maeta +3 more | 2016-08-09 |