Issued Patents All Time
Showing 26–50 of 112 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10886097 | Plasma processing apparatus and plasma processing method | Kazuhiro Kubota | 2021-01-05 |
| 10886138 | Substrate processing method and substrate processing apparatus | Timothy Tianshyun Yang, Shinya Morikita, Kiyohito Ito, Michiko Nakaya | 2021-01-05 |
| 10886136 | Method for processing substrates | Toru Hisamatsu, Yoshihide Kihara | 2021-01-05 |
| 10777422 | Method for processing target object | Yoshihide Kihara, Toru Hisamatsu | 2020-09-15 |
| 10777425 | Method of processing substrate | Masahiro Tabata, Toru Hisamatsu, Sho Kumakura, Ryuichi Asako, Shinya Ishikawa | 2020-09-15 |
| 10651044 | Processing method and plasma processing apparatus | Michiko Nakaya | 2020-05-12 |
| 10586710 | Etching method | Maju TOMURA, Yoshihide Kihara | 2020-03-10 |
| 10541147 | Etching method | Masahiro Tabata, Takayuki Katsunuma | 2020-01-21 |
| 10504741 | Semiconductor manufacturing method and plasma processing apparatus | Michiko Nakaya, Toru Hisamatsu, Masahiro Tabata | 2019-12-10 |
| 10504745 | Method for processing target object | Yoshihide Kihara, Toru Hisamatsu | 2019-12-10 |
| 10460963 | Plasma processing method | Shuhei Ogawa, Wanjae Park, Yoshihide Kihara | 2019-10-29 |
| 10290468 | Electrode for plasma processing apparatus, plasma processing apparatus, plasma processing method and storage medium | Shinji Himori | 2019-05-14 |
| 10233535 | Plasma processing apparatus and plasma processing method | Yoshihide Kihara, Toru Hisamatsu | 2019-03-19 |
| 10090191 | Selective plasma etching method of a first region containing a silicon atom and an oxygen atom | Maju TOMURA, Takayuki Katsunuma | 2018-10-02 |
| 9972503 | Etching method | Maju TOMURA | 2018-05-15 |
| 9911622 | Method of processing target object | Yoshihide Kihara, Toru Hisamatsu, Tomoyuki Oishi | 2018-03-06 |
| 9887109 | Plasma etching method and plasma etching apparatus | Masaya Kawamata, Kazuhiro Kubota | 2018-02-06 |
| 9881806 | Method of manufacturing a semiconductor device | Takayuki Katsunuma, Kazuhiro Kubota, Hironobu Ichikawa | 2018-01-30 |
| 9852922 | Plasma processing method | Hikaru Watanabe | 2017-12-26 |
| 9837285 | Etching method | Maju TOMURA | 2017-12-05 |
| 9735027 | Method for etching organic film | Chungjong Lee, Takayuki Katsunuma | 2017-08-15 |
| 9721766 | Method for processing target object | Yoshihide Kihara, Toru Hisamatsu, Tomoyuki Oishi | 2017-08-01 |
| 9607811 | Workpiece processing method | Yoshihide Kihara, Toru Hisamatsu | 2017-03-28 |
| 9583361 | Method of processing target object and plasma processing apparatus | Yoshihide Kihara, Hiromi Mochizuki, Masaya Kawamata, Ken Kobayashi, Ryoichi Yoshida | 2017-02-28 |
| 9524876 | Plasma etching method and plasma etching apparatus | Toru Hisamatsu | 2016-12-20 |