Issued Patents All Time
Showing 51–75 of 125 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10962881 | Method and apparatus for lithography in semiconductor fabrication | Cheng-Kuan Wu, Po-Chung Cheng, Li-Jui Chen | 2021-03-30 |
| 10871713 | Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Li-Jui Chen, Po-Chung Cheng +1 more | 2020-12-22 |
| 10852649 | Methods and apparatus for removing contamination from lithographic tool | Zi-Wen Chen, Po-Chung Cheng, Li-Jui Chen, Shih-Chang Shih | 2020-12-01 |
| 10831094 | Pellicle for EUV mask and fabrication thereof | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2020-11-10 |
| 10824080 | Method to reduce native defect printability | Tsung-Chih Chien, Tsung Chuan Lee | 2020-11-03 |
| 10756016 | Interconnection structure and methods of fabrication the same | Shih-Ming Chang | 2020-08-25 |
| 10747097 | Mask with multilayer structure and manufacturing method by using the same | Jeng-Horng Chen, Shinn-Sheng Yu, Anthony Yen | 2020-08-18 |
| 10720419 | Layout modification method for exposure manufacturing process | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Li-Jui Chen, Po-Chung Cheng +1 more | 2020-07-21 |
| 10712651 | Method and apparatus for collecting information used in image-error compensation | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Li-Jui Chen, Po-Chung Cheng +1 more | 2020-07-14 |
| 10642158 | Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Li-Jui Chen, Po-Chung Cheng +1 more | 2020-05-05 |
| 10642148 | High durability extreme ultraviolet photomask | Chia-Hao Yu, Chi-Lun Lu, Ching-Wei Shen, Jeng-Horng Chen | 2020-05-05 |
| 10534279 | Methods and apparatus for removing contamination from lithographic tool | Zi-Wen Chen, Po-Chung Cheng, Li-Jui Chen, Shih-Chang Shih | 2020-01-14 |
| 10520806 | Pellicle for EUV mask and fabrication thereof | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2019-12-31 |
| 10522464 | Interconnection structure and methods of fabrication the same | Shih-Ming Chang | 2019-12-31 |
| 10509334 | Methods and apparatus for removing contamination from lithographic tool | Zi-Wen Chen, Po-Chung Cheng, Li-Jui Chen, Shih-Chang Shih | 2019-12-17 |
| 10366973 | Layout modification method for exposure manufacturing process | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Li-Jui Chen, Po-Chung Cheng +1 more | 2019-07-30 |
| 10276372 | Method for integrated circuit patterning | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2019-04-30 |
| 10274819 | EUV pellicle fabrication methods and structures thereof | Pei-Cheng Hsu, Jeng-Horng Chen, Chih-Cheng Lin, Hsin-Chang Lee, Shinn-Sheng Yu +2 more | 2019-04-30 |
| 10168611 | Mask with multilayer structure and manufacturing method by using the same | Jeng-Horng Chen, Shinn-Sheng Yu, Anthony Yen | 2019-01-01 |
| 10061191 | High durability extreme ultraviolet photomask | Chia-Hao Yu, Chi-Lun Lu, Ching-Wei Shen, Jeng-Horng Chen | 2018-08-28 |
| 10031411 | Pellicle for EUV mask and fabrication thereof | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2018-07-24 |
| 10007174 | Extreme ultraviolet lithography process and mask | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2018-06-26 |
| 9995683 | Apparatus for single-molecule detection | Chung-Fan Chiou, Rung-Ywan Tsai, Yu-Tang Li, Ming-Chia Li, Chang-Sheng Chu +3 more | 2018-06-12 |
| 9886543 | Method providing for asymmetric pupil configuration for an extreme ultraviolet lithography process | Chia-Chun Chung, Norman Chen, Jeng-Horng Chen, Shinn-Sheng Yu, Anthony Yen | 2018-02-06 |
| 9869928 | Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof | Tao Huang, Chia-Jen Chen, Hsin-Chang Lee, Anthony Yen | 2018-01-16 |