Issued Patents All Time
Showing 76–100 of 125 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9823585 | EUV focus monitoring systems and methods | Chieh-Jen Cheng, Jeng-Horng Chen, Chia-Chen Chen, Shinn-Sheng Yu, Anthony Yen +1 more | 2017-11-21 |
| 9786602 | Interconnection structure and methods of fabrication the same | Shih-Ming Chang | 2017-10-10 |
| 9777321 | Single molecule detection system and methods | Chung-Fan Chiou, Ying-Chih Pu, Chao-Chi Pan, Ming-Chia Li, Chein-Shiu Kuo +2 more | 2017-10-03 |
| 9766536 | Mask with multilayer structure and manufacturing method by using the same | Jeng-Horng Chen, Shinn-Sheng Yu, Anthony Yen | 2017-09-19 |
| 9748133 | Via definition scheme | Yen-Cheng Lu, Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2017-08-29 |
| 9726983 | Method to define multiple layer patterns with a single exposure by charged particle beam lithography | Yen-Cheng Lu, Jeng-Horng Chen, Shinn-Sheng Yu, Anthony Yen | 2017-08-08 |
| 9728408 | Method of semiconductor integrated circuit fabrication | Chung-Ju Lee, Jeng-Horng Chen, Shinn-Sheng Yu, Tsung-Min Huang, Anthony Yen | 2017-08-08 |
| 9709884 | EUV mask and manufacturing method by using the same | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2017-07-18 |
| 9685367 | Photomask for forming multiple layer patterns with a single exposure | Yen-Cheng Lu, Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2017-06-20 |
| 9679803 | Method for forming different patterns in a semiconductor structure using a single mask | Tsung-Min Huang, Chung-Ju Lee, Yen-Cheng Lu | 2017-06-13 |
| 9664999 | Method of making an extreme ultraviolet pellicle | Tien-Hsi Lee, Chia-Jen Chen, Shang-Chieh Chien, Shinn-Sheng Yu, Jeng-Horng Chen +1 more | 2017-05-30 |
| 9612523 | Structure and method for reflective-type mask | Chi-Lun Lu, Jeng-Horng Chen, Chia-Chen Chen, Shinn-Sheng Yu, Anthony Yen +1 more | 2017-04-04 |
| 9588419 | Extreme ultraviolet light (EUV) photomasks and fabrication methods thereof | Yen-Cheng Lu, Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2017-03-07 |
| 9588417 | Photomask pellicle | Chia-Chun Chung, Chia-Hao Hsu | 2017-03-07 |
| 9557649 | Assist feature for a photolithographic process | Tao Huang, Chia-Jen Chen, Hsin-Chang Lee, Shinn-Sheng Yu, Jeng-Horng Chen +1 more | 2017-01-31 |
| 9535316 | Photomask with three states for forming multiple layer patterns with a single exposure | Yen-Cheng Lu, Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2017-01-03 |
| 9529249 | Extreme ultraviolet lithography process and mask | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2016-12-27 |
| 9482615 | Single-molecule detection system and methods | Chung-Fan Chiou, Ying-Chih Pu, Chao-Chi Pan, Ming-Chia Li, Chein-Shiu Kuo +2 more | 2016-11-01 |
| 9442368 | Method of making an extreme ultraviolet pellicle | Tien-Hsi Lee, Chia-Jen Chen, Shang-Chieh Chien, Shinn-Sheng Yu, Jeng-Horng Chen +1 more | 2016-09-13 |
| 9418862 | Method for integrated circuit patterning | Tsung-Min Huang, Chieh-Han Wu, Chung-Ju Lee, Jeng-Horng Chen, Shinn-Sheng Yu | 2016-08-16 |
| 9412647 | Via definition scheme | Yen-Cheng Lu, Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2016-08-09 |
| 9405195 | Method to define multiple layer patterns with a single exposure by charged particle beam lithography | Yen-Cheng Lu, Jeng-Horng Chen, Shinn-Sheng Yu, Anthony Yen | 2016-08-02 |
| 9389506 | Photoresist having improved extreme-ultraviolet lithography imaging performance | Shu-Hao Chang, Tsiao-Chen Wu | 2016-07-12 |
| 9354507 | Extreme ultraviolet lithography process and mask | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2016-05-31 |
| 9316900 | Extreme ultraviolet lithography process and mask | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2016-04-19 |