Issued Patents All Time
Showing 26–50 of 125 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11774844 | Extreme ultraviolet mask and method of manufacturing the same | Tsung-Chih Chien, Shih-Chi Fu, Chi-Hua FU, Kuotang CHENG, Bo-Tsun Liu +1 more | 2023-10-03 |
| 11720025 | Extreme ultraviolet lithography method, extreme ultraviolet mask and formation method thereof | Yu-Hsun Wu, Bo-Tsun Liu, Tsung Chuan Lee | 2023-08-08 |
| 11714239 | Optical device for coupling light | Chan-Hong Chern, Chih-Chang Lin, Chewn-Pu Jou, Feng-Wei Kuo, Lan-Chou Cho +2 more | 2023-08-01 |
| 11703762 | Method of reducing undesired light influence in extreme ultraviolet exposure | Chen-Ming Wang, Yahru Cheng, Bo-Tsun Liu, Tsung Chuan Lee | 2023-07-18 |
| 11693186 | Two-dimensional grating coupler and methods of making same | Chewn-Pu Jou, Stefan Rusu, Felix Ying-Kit Tsui, Lan-Chou Cho | 2023-07-04 |
| 11686900 | Semiconductor package, optical device and method of fabricating the same | Felix Yingkit Tsui, Stefan Rusu, Chewn-Pu Jou | 2023-06-27 |
| 11657492 | Reticle backside inspection method | Zi-Wen Chen, Po-Chung Cheng, Li-Jui Chen, Shih-Chang Shih | 2023-05-23 |
| 11614683 | Reticle enclosure for lithography systems | Tsung-Chih Chien, Tsung Chuan Lee, Hao-Shiang Chang | 2023-03-28 |
| 11594528 | Layout modification method for exposure manufacturing process | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Li-Jui Chen, Po-Chung Cheng +1 more | 2023-02-28 |
| 11550228 | System and apparatus for lithography in semiconductor fabrication | Cheng-Kuan Wu, Po-Chung Cheng, Li-Jui Chen | 2023-01-10 |
| 11506985 | Semiconductor apparatus and method of operating the same for preventing photomask particulate contamination | Jui-Chieh Chen, Tsung-Chih Chien, Tsung Chuan Lee | 2022-11-22 |
| 11480869 | Photomask with enhanced contamination control and method of forming the same | Chien-Hung Lai, Hao-Ming Chang, Chia-Shih Lin, Hsuan-Wen Wang, Yu-Hsin Hsu +1 more | 2022-10-25 |
| 11448828 | Optical device for coupling light | Chan-Hong Chern, Chih-Chang Lin, Chewn-Pu Jou, Feng-Wei Kuo, Lan-Chou Cho +2 more | 2022-09-20 |
| 11424175 | Semiconductor device with heating structure | Chewn-Pu Jou, Stefan Rusu, Feng-Wei Kuo | 2022-08-23 |
| 11415879 | Reticle enclosure for lithography systems | Tsung-Chih Chien, Tsung Chuan Lee, Hao-Shiang Chang | 2022-08-16 |
| 11392022 | Extreme ultraviolet lithography method, extreme ultraviolet mask and formation method thereof | Yu-Hsun Wu, Bo-Tsun Liu, Tsung Chuan Lee | 2022-07-19 |
| 11275301 | Extreme ultraviolet mask and method of manufacturing the same | Tsung-Chih Chien, Shih-Chi Fu, Chi-Hua FU, Kuotang CHENG, Bo-Tsun Liu +1 more | 2022-03-15 |
| 11150561 | Method and apparatus for collecting information used in image-error compensation | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Li-Jui Chen, Po-Chung Cheng +1 more | 2021-10-19 |
| 11119420 | Particle prevention method in lithography exposure apparatus | Yi-Wei Lee, Jui-Chieh Chen, Tsung Chuan Lee | 2021-09-14 |
| 11086209 | EUV lithography mask with a porous reflective multilayer structure | Shih-Chang Shih, Li-Jui Chen, Po-Chung Cheng | 2021-08-10 |
| 11073755 | Mask with multilayer structure and manufacturing method by using the same | Jeng-Horng Chen, Shinn-Sheng Yu, Anthony Yen | 2021-07-27 |
| 11024623 | Layout modification method for exposure manufacturing process | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Li-Jui Chen, Po-Chung Cheng +1 more | 2021-06-01 |
| 11003069 | High durability extreme ultraviolet photomask | Chia-Hao Yu, Chi-Lun Lu, Ching-Wei Shen, Jeng-Horng Chen | 2021-05-11 |
| 10997706 | Reticle backside inspection method | Zi-Wen Chen, Po-Chung Cheng, Li-Jui Chen, Shih-Chang Shih | 2021-05-04 |
| 10976674 | Method for detecting EUV pellicle rupture | Bo-Tsun Liu, Tsung Chuan Lee | 2021-04-13 |