Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12216399 | Method of manufacturing semiconductor device | Chih-Tsung Shih, Tsung-Chih Chien, Hao-Shiang Chang | 2025-02-04 |
| 12181791 | Extreme ultraviolet mask and method of manufacturing the same | Chih-Tsung Shih, Tsung-Chih Chien, Shih-Chi Fu, Chi-Hua FU, Kuotang CHENG +1 more | 2024-12-31 |
| 12072633 | Extreme ultraviolet lithography method, extreme ultraviolet mask and formation method thereof | Chih-Tsung Shih, Yu-Hsun Wu, Bo-Tsun Liu | 2024-08-27 |
| 12066765 | Operating method for preventing photomask particulate contamination | Jui-Chieh Chen, Tsung-Chih Chien, Chih-Tsung Shih | 2024-08-20 |
| 12013641 | Method of reducing undesired light influence in extreme ultraviolet exposure | Chih-Tsung Shih, Chen-Ming Wang, Yahru Cheng, Bo-Tsun Liu | 2024-06-18 |
| 11940727 | Reticle enclosure for lithography systems | Chih-Tsung Shih, Tsung-Chih Chien, Hao-Shiang Chang | 2024-03-26 |
| 11774844 | Extreme ultraviolet mask and method of manufacturing the same | Chih-Tsung Shih, Tsung-Chih Chien, Shih-Chi Fu, Chi-Hua FU, Kuotang CHENG +1 more | 2023-10-03 |
| 11720025 | Extreme ultraviolet lithography method, extreme ultraviolet mask and formation method thereof | Chih-Tsung Shih, Yu-Hsun Wu, Bo-Tsun Liu | 2023-08-08 |
| 11703762 | Method of reducing undesired light influence in extreme ultraviolet exposure | Chih-Tsung Shih, Chen-Ming Wang, Yahru Cheng, Bo-Tsun Liu | 2023-07-18 |
| 11614683 | Reticle enclosure for lithography systems | Chih-Tsung Shih, Tsung-Chih Chien, Hao-Shiang Chang | 2023-03-28 |
| 11506985 | Semiconductor apparatus and method of operating the same for preventing photomask particulate contamination | Jui-Chieh Chen, Tsung-Chih Chien, Chih-Tsung Shih | 2022-11-22 |
| 11415879 | Reticle enclosure for lithography systems | Chih-Tsung Shih, Tsung-Chih Chien, Hao-Shiang Chang | 2022-08-16 |
| 11392022 | Extreme ultraviolet lithography method, extreme ultraviolet mask and formation method thereof | Chih-Tsung Shih, Yu-Hsun Wu, Bo-Tsun Liu | 2022-07-19 |
| 11275301 | Extreme ultraviolet mask and method of manufacturing the same | Chih-Tsung Shih, Tsung-Chih Chien, Shih-Chi Fu, Chi-Hua FU, Kuotang CHENG +1 more | 2022-03-15 |
| 11119420 | Particle prevention method in lithography exposure apparatus | Yi-Wei Lee, Jui-Chieh Chen, Chih-Tsung Shih | 2021-09-14 |
| 10976674 | Method for detecting EUV pellicle rupture | Chih-Tsung Shih, Bo-Tsun Liu | 2021-04-13 |
| 10824080 | Method to reduce native defect printability | Chih-Tsung Shih, Tsung-Chih Chien | 2020-11-03 |
| 9625822 | Mechanisms for performing a photolithography process with a surface modifying treatment on an exposed photoresist layer | Chi-Cheng Tsai, Hung-Chi Wu, Chung-Hsien Lin | 2017-04-18 |