SM

Steven T. Mayer

NS Novellus Systems: 134 patents #1 of 780Top 1%
Lam Research: 33 patents #64 of 2,128Top 4%
University of California: 15 patents #295 of 18,278Top 2%
AT Atari: 7 patents #1 of 59Top 2%
PO Polystor: 5 patents #1 of 12Top 9%
UE US Dept of Energy: 3 patents #296 of 5,099Top 6%
Adobe: 1 patents #2,549 of 4,589Top 60%
📍 Barlow, OR: #1 of 7 inventorsTop 15%
🗺 Oregon: #53 of 28,073 inventorsTop 1%
Overall (All Time): #3,326 of 4,157,543Top 1%
201
Patents All Time

Issued Patents All Time

Showing 151–175 of 201 patents

Patent #TitleCo-InventorsDate
6800187 Clamshell apparatus for electrochemically treating wafers Jonathan D. Reid, R. Marshall Stowell, Evan E. Patton, Jeff Hawkins 2004-10-05
6793796 Electroplating process for avoiding defects in metal features of integrated circuit devices Jonathan D. Reid, David Craig Smith, Jon Henri, Sesha Varadarajan 2004-09-21
6773571 Method and apparatus for uniform electroplating of thin metal seeded wafers using multiple segmented virtual anode sources Evan E. Patton, Brian Paul Blackman, Jonathan D. Reid, Thomas A. Ponnuswamy, Harold D. Perry 2004-08-10
6755954 Electrochemical treatment of integrated circuit substrates using concentric anodes and variable field shaping elements Timothy Cleary, Michael J. Janicki, Edmund Minshall, Thomas A. Ponnuswamy 2004-06-29
6755946 Clamshell apparatus with dynamic uniformity control Evan E. Patton, Jonathan D. Reid, Jeffrey A. Hawkins, Dinesh S. Kalakkad 2004-06-29
6713122 Methods and apparatus for airflow and heat management in electroless plating John B. Alexy, Jingbin Feng 2004-03-30
6709565 Method and apparatus for uniform electropolishing of damascene ic structures by selective agitation Robert J. Contolini, Eliot K. Broadbent, John Drewery 2004-03-23
6664122 Electroless copper deposition method for preparing copper seed layers Tatyana N. Andryuschenko, Jonathan D. Reid, Eric G. Webb 2003-12-16
6586342 Edge bevel removal of copper from silicon wafers Seshasayee Varadarajan, Andrew J. McCutcheon 2003-07-01
6562204 Apparatus for potential controlled electroplating of fine patterns on semiconductor wafers Jonathan D. Reid, Robert J. Contolini 2003-05-13
6551487 Methods and apparatus for controlled-angle wafer immersion Jonathan D. Reid, Seshasayee Varadarajan, David Craig Smith, Evan E. Patton, Dinesh S. Kalakkad +1 more 2003-04-22
6551483 Method for potential controlled electroplating of fine patterns on semiconductor wafers Jonathan D. Reid, Robert J. Contolini 2003-04-22
6537416 Wafer chuck for use in edge bevel removal of copper from silicon wafers Steve Taatjes, Andy McCutcheon, Jim Schall, Jinbin Feng 2003-03-25
6527920 Copper electroplating apparatus Evan E. Patton, Robert Jackson, Jonathan D. Reid 2003-03-04
6402923 Method and apparatus for uniform electroplating of integrated circuits using a variable field shaping element Richard Hill, Alain Harrus, Evan E. Patton, Robert J. Contolini, Steve Taatjes +1 more 2002-06-11
6379842 Mixed lithium manganese oxide and lithium nickel cobalt oxide positive electrodes 2002-04-30
6332990 Method for fabricating composite carbon foam Richard W. Pekala, James L. Kaschmitter 2001-12-25
6333275 Etchant mixing system for edge bevel removal of copper from silicon wafers John B. Alexy, Jinbin Feng 2001-12-25
6315883 Electroplanarization of large and small damascene features using diffusion barriers and electropolishing Robert J. Contolini 2001-11-13
6309981 Edge bevel removal of copper from silicon wafers Carl J. Russo, Evan E. Patton 2001-10-30
6201924 Disk-assisted editing for recorded video material Stephen E. Crane, Leeann Heringer, Michael Shinsky, Gerald A. Raitzer, Michael A. Ogrinc 2001-03-13
6007947 Mixed lithium manganese oxide and lithium nickel cobalt oxide positive electrodes 1999-12-28
5932185 Method for making thin carbon foam electrodes Richard W. Pekala, James L. Kaschmitter, Robert L. Morrison 1999-08-03
5908896 Organic aerogel microspheres Fung-Ming Kong, Richard W. Pekala, James L. Kaschmitter 1999-06-01
5898564 Capacitor with a composite carbon foam electrode Richard W. Pekala, James L. Kaschmitter 1999-04-27