Issued Patents All Time
Showing 1–25 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12019225 | Optical system, optical apparatus, imaging apparatus, and method for manufacturing optical system and imaging apparatus | Toru Iwane, Kyoya TOKUNAGA, Tomoki Ito | 2024-06-25 |
| 6855997 | Mask, exposure method, line width measuring method, and method for manufacturing semiconductor devices | — | 2005-02-15 |
| 6750952 | Apparatus for preforming measurement of a dimension of a test mark for semiconductor processing | Ilya Grodnensky, Kazuo Ushida, Eric R. Johnson | 2004-06-15 |
| 6610460 | Exposure method | Masaya Komatsu, Kazuo Ushida | 2003-08-26 |
| 6449031 | Method for use of a critical dimensional test structure | Ilya Grodnensky, Kazuo Ushida, Eric R. Johnson | 2002-09-10 |
| 6191429 | Projection exposure apparatus and method with workpiece area detection | — | 2001-02-20 |
| 6094256 | Method for forming a critical dimension test structure and its use | Ilya Grodnensky, Kazuo Ushida, Eric R. Johnson | 2000-07-25 |
| 5870197 | Precision stage interferometer system with local single air duct | Michael Sogard, John K. Eaton, Naoyuki Kobayashi | 1999-02-09 |
| 5838450 | Direct reticle to wafer alignment using fluorescence for integrated circuit lithography | John H. McCoy, Martin E. Lee | 1998-11-17 |
| 5835227 | Method and apparatus for determining performance characteristics in lithographic tools | Ilya Grodnensky, Etsuya Morita, Shigeru Hirukawa | 1998-11-10 |
| 5825043 | Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus | — | 1998-10-20 |
| 5777729 | Wafer inspection method and apparatus using diffracted light | Arun Ananth Aiyer, John H. McCoy, Henry K. Chau | 1998-07-07 |
| 5741614 | Atomic force microscope measurement process for dense photoresist patterns | John H. McCoy | 1998-04-21 |
| 5698069 | Technique for detecting particles on a wafer support surface | Arun A. Aiyer | 1997-12-16 |
| 5666205 | Measuring method and exposure apparatus | Hiroki Tateno, Koji Kaise, Yuji Imai | 1997-09-09 |
| 5615006 | Imaging characteristic and asymetric abrerration measurement of projection optical system | Shigeru Hirukawa, Shinjiro Kondo, Takeshi Kato | 1997-03-25 |
| 5434026 | Exposure condition measurement method | Norihiko Takatsu, Shinichi Nakamura, Hiroaki Hosokawa, Shigeru Hirukawa | 1995-07-18 |
| 5402224 | Distortion inspecting method for projection optical system | Shigeru Hirukawa, Nobutaka Magome | 1995-03-28 |
| 4965630 | Projection exposure apparatus | Kinya Kato, Kazuo Ushida, Toshiyuki Namikawa, Koichi Matsumoto, Koichi Ohno | 1990-10-23 |
| 4931830 | Projection exposure apparatus | Kazuo Ushida, Takeshi Suto, Masaomi Kameyama, Shigeru Hirukawa, Shinichi Nakamura | 1990-06-05 |
| 4908656 | Method of dimension measurement for a pattern formed by exposure apparatus, and method for setting exposure conditions and for inspecting exposure precision | Shigeru Hirukawa, Hiroki Tateno | 1990-03-13 |
| 4806987 | Projection-exposing apparatus | Takashi Mori, Koichi Matsumoto, Tsutomu Takai, Masaichi Murakami | 1989-02-21 |
| RE32795 | Exposure apparatus for production of integrated circuit | Toshio Matsuura, Hisayuki Shimizu, Akikazu Tanimoto | 1988-12-06 |
| 4770533 | Apparatus for detecting position of an object such as a semiconductor wafer | — | 1988-09-13 |
| 4748478 | Projection exposure apparatus | Hiroshi Tanaka | 1988-05-31 |