| 6873400 |
Scanning exposure method and system |
Masaki Kato, Katsuya Machino, Manabu Toguchi |
2005-03-29 |
| 6356341 |
Exposure device, beam shape setting device and illuminating area setting device |
Norimi Takemura, Noritsugu Hanazaki |
2002-03-12 |
| 5920378 |
Projection exposure apparatus |
Hiroshi Shirasu, Tomohide Hamada, Kazuaki Saiki, Susumu Mori |
1999-07-06 |
| 5912726 |
Projection exposure apparatus and method having a positional deviation detection system that employs light from an exposure illumination system |
Manabu Toguchi, Kei Nara, Nobutaka Fujimori, Toshio Matsuura |
1999-06-15 |
| H1733 |
Exposure method |
Kei Nara, Nobutaka Fujimori |
1998-06-02 |
| 5486896 |
Exposure apparatus |
Junji Hazama, Masamitsu Yanagihara, Hideji Goto |
1996-01-23 |
| 5442418 |
Exposure method |
Muneyasu Yokota, Toshio Matsuura, Atsuyuki Aoki |
1995-08-15 |
| 4860374 |
Apparatus for detecting position of reference pattern |
Seiro Murakami, Akikazu Tanimoto, Susumu Makinouchi, Hidemi Kawai |
1989-08-22 |
| 4806987 |
Projection-exposing apparatus |
Takashi Mori, Koichi Matsumoto, Tsutomu Takai, Kyoichi Suwa |
1989-02-21 |
| 4741622 |
Method and apparatus for detecting diversion |
Kyoichi Suwa |
1988-05-03 |
| 4704020 |
Projection optical apparatus |
Hidemi Kawai, Kyoichi Suwa |
1987-11-03 |
| 4679942 |
Method of aligning a semiconductor substrate and a photomask |
Kyoichi Suwa, Hidemi Kawai |
1987-07-14 |