Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12162070 | Processing system, processing method, computer program, recording medium, and control apparatus | — | 2024-12-10 |
| 9958786 | Cleanup method for optics in immersion lithography using object on wafer holder in place of wafer | Douglas C. Watson | 2018-05-01 |
| 8670103 | Cleanup method for optics in immersion lithography using bubbles | — | 2014-03-11 |
| 8670104 | Cleanup method for optics in immersion lithography with cleaning liquid opposed by a surface of object | — | 2014-03-11 |
| 8493545 | Cleanup method for optics in immersion lithography supplying cleaning liquid onto a surface of object below optical element, liquid supply port and liquid recovery port | W. Thomas Novak | 2013-07-23 |
| 8269946 | Cleanup method for optics in immersion lithography supplying cleaning liquid at different times than immersion liquid | — | 2012-09-18 |
| 8085381 | Cleanup method for optics in immersion lithography using sonic device | Douglas C. Watson, W Thomas Novak | 2011-12-27 |
| 7522259 | Cleanup method for optics in immersion lithography | Andrew J. Hazelton, Douglas C. Watson, W Thomas Novak | 2009-04-21 |
| RE38176 | Scanning exposure method | Shinji Wakamoto, Fuyuhiko Inoue | 2003-07-08 |
| 6195155 | Scanning type exposure method | — | 2001-02-27 |
| 6175405 | Projection exposure method and method of manufacturing a projection exposure apparatus | — | 2001-01-16 |
| 5912727 | Projection exposure method in which mask patterns are imaged on photosensitive substrates with adjustment of illumination and projection parameters corresponding to the mask pattern | — | 1999-06-15 |
| 5671057 | Alignment method | — | 1997-09-23 |
| 5617182 | Scanning exposure method | Shinji Wakamoto, Fuyuhiko Inoue | 1997-04-01 |
| 5220176 | Apparatus and method for detecting alignment marks having alignment optical systems' driving means | — | 1993-06-15 |
| 5117255 | Projection exposure apparatus | Naomasa Shiraishi, Tetsuo Taniguchi | 1992-05-26 |
| 4860374 | Apparatus for detecting position of reference pattern | Seiro Murakami, Akikazu Tanimoto, Susumu Makinouchi, Masaichi Murakami | 1989-08-22 |
| 4780616 | Projection optical apparatus for mask to substrate alignment | Kenji Nishi, Kazuaki Suzuki, Makoto Uehara | 1988-10-25 |
| 4780747 | Projection exposure apparatus | Kazuaki Suzuki, Hideo Mizutani | 1988-10-25 |
| 4704020 | Projection optical apparatus | Masaichi Murakami, Kyoichi Suwa | 1987-11-03 |
| 4679942 | Method of aligning a semiconductor substrate and a photomask | Kyoichi Suwa, Masaichi Murakami | 1987-07-14 |