| 11231608 |
Optical component comprising liquid crystals in a blue phase and process for making such optical component |
Eva Oton, Toshiki NAKANO, Estelle NETTER, Yukiko Katayama |
2022-01-25 |
| 6813022 |
Interferometer system |
— |
2004-11-02 |
| 6785005 |
Switching type dual wafer stage |
— |
2004-08-31 |
| 6724464 |
Position detecting method and unit, optical characteristic measuring method and unit, exposure apparatus, and device manufacturing method |
Juping Yang, Toru Fujii |
2004-04-20 |
| 6714282 |
Position detecting method optical characteristic measuring method and unit, exposure apparatus, and device manufacturing method |
— |
2004-03-30 |
| 6674512 |
Interferometer system for a semiconductor exposure system |
W. Thomas Novak, David Stumbo |
2004-01-06 |
| 6665054 |
Two stage method |
— |
2003-12-16 |
| RE38176 |
Scanning exposure method |
Shinji Wakamoto, Hidemi Kawai |
2003-07-08 |
| 6509971 |
Interferometer system |
David Stumbo |
2003-01-21 |
| H1972 |
Autofocus system using common path interferometry |
— |
2001-07-03 |
| 6160628 |
Interferometer system and method for lens column alignment |
— |
2000-12-12 |
| 5617182 |
Scanning exposure method |
Shinji Wakamoto, Hidemi Kawai |
1997-04-01 |
| 4971413 |
Laser beam depicting apparatus |
— |
1990-11-20 |
| 4761561 |
Laser beam scanning pattern generation system with positional and dimensional error correction |
Yoshihisa Fujiwara, Akikazu Tanimoto, Hisakazu Kato, Manabu Hosoya, Shinji Miura +1 more |
1988-08-02 |