| 6376329 |
Semiconductor wafer alignment using backside illumination |
Michael Sogard |
2002-04-23 |
| 6316164 |
Proximity effect correction method through uniform removal of fraction of interior pixels |
N. William Parker, Daniel L. Cavan, Alan D. Brodie |
2001-11-13 |
| 6014200 |
High throughput electron beam lithography system |
Michael Sogard |
2000-01-11 |
| 5936254 |
Thin film detection method and apparatus |
Arun A. Aiyer, Henry K. Chau |
1999-08-10 |
| 5838450 |
Direct reticle to wafer alignment using fluorescence for integrated circuit lithography |
Martin E. Lee, Kyoichi Suwa |
1998-11-17 |
| 5777729 |
Wafer inspection method and apparatus using diffracted light |
Arun Ananth Aiyer, Kyoichi Suwa, Henry K. Chau |
1998-07-07 |
| 5741614 |
Atomic force microscope measurement process for dense photoresist patterns |
Kyoichi Suwa |
1998-04-21 |
| 5648854 |
Alignment system with large area search for wafer edge and global marks |
Kyochi Suwa |
1997-07-15 |
| 5437946 |
Multiple reticle stitching for scanning exposure system |
— |
1995-08-01 |