Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11081340 | Argon addition to remote plasma oxidation | Hansel LO, Christopher S. Olsen, Eric Kihara Shono, Erika HANSEN, Taewan Kim +1 more | 2021-08-03 |
| 10971357 | Thin film treatment process | Wei Liu, Theresa Kramer Guarini, Linlin Wang, Malcolm J. Bevan, Vladimir Nagorny +4 more | 2021-04-06 |
| 10636650 | Argon addition to remote plasma oxidation | Hansel LO, Christopher S. Olsen, Eric Kihara Shono, Erika HANSEN, Taewan Kim +1 more | 2020-04-28 |
| 10580643 | Fluorination during ALD high-k, fluorination post high-k and use of a post fluorination anneal to engineer fluorine bonding and incorporation | Linlin Wang, Wei Liu | 2020-03-03 |
| 10510545 | Hydrogenation and nitridization processes for modifying effective oxide thickness of a film | Houda Graoui, Wei Liu, Steven C. H. Hung | 2019-12-17 |
| 10504779 | Hydrogenation and nitridization processes for reducing oxygen content in a film | Wei Liu, Houda Graoui, Shashank Sharma, Shankar Muthukrishnan, Rene George | 2019-12-10 |
| 10431466 | Hydrogenation and nitridization processes for modifying effective oxide thickness of a film | Wei Liu, Houda Graoui, Steven C. H. Hung | 2019-10-01 |
| 10347492 | Modifying work function of a metal film with a plasma process | Steven C. H. Hung, Wei Liu, Houda Graoui | 2019-07-09 |
| 10236207 | Hydrogenation and nitridization processes for reducing oxygen content in a film | Wei Liu, Houda Graoui, Shashank Sharma, Shankar Muthukrishnan, Rene George | 2019-03-19 |
| 10103027 | Hydrogenation and nitridization processes for modifying effective oxide thickness of a film | Wei Liu, Houda Graoui, Shashank Sharma | 2018-10-16 |
| 9514968 | Methods and apparatus for selective oxidation of a substrate | Agus Sofian Tjandra, Christopher S. Olsen, Lara Hawrylchak | 2016-12-06 |
| 9054048 | NH3 containing plasma nitridation of a layer on a substrate | Wei Liu, Malcolm J. Bevan, Christopher S. Olsen | 2015-06-09 |
| 9023700 | Method and apparatus for single step selective nitridation | Udayan Ganguly, Theresa Kramer Guarini, Matthew S. Rogers, Yoshitaka Yokota, Malcolm J. Bevan | 2015-05-05 |
| 8846509 | Remote radical hydride dopant incorporation for delta doping in silicon | Christopher S. Olsen | 2014-09-30 |
| 8748259 | Method and apparatus for single step selective nitridation | Udayan Ganguly, Theresa Kramer Guarini, Matthew S. Rogers, Yoshitaka Yokota, Malcolm J. Bevan | 2014-06-10 |
| 8309440 | Method and apparatus for cleaning a substrate surface | Errol Antonio C. Sanchez, David K. Carlson, Roisin L. Doherty | 2012-11-13 |
| 8198671 | Modification of charge trap silicon nitride with oxygen plasma | Christopher S. Olsen, Tze Wing Poon, Udayan Ganguly | 2012-06-12 |
| 8137463 | Dual zone gas injection nozzle | Wei Liu, Hanh Nguyen, Son T. Nguyen, Roger Curtis, Philip A. Bottini | 2012-03-20 |
| 8008166 | Method and apparatus for cleaning a substrate surface | Errol Antonio C. Sanchez, David K. Carlson, Roisin L. Doherty | 2011-08-30 |
| 7972933 | Method of selective nitridation | Christopher S. Olsen, Udayan Ganguly, Theresa Kramer Guarini, Yonah Cho | 2011-07-05 |