Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12092966 | Device feature specific edge placement error (EPE) | Amnon Manassen, Nadav Gutman, Andrei V. Shchegrov | 2024-09-17 |
| 12085385 | Design-assisted large field of view metrology | Stefan Eyring | 2024-09-10 |
| 11637030 | Multi-stage, multi-zone substrate positioning systems | Yoram Uziel, Ulrich Pohlmann, Nadav Gutman, Ariel Hildesheim, Aviv Balan | 2023-04-25 |
| 10533848 | Metrology and control of overlay and edge placement errors | Andrei V. Shchegrov, Nadav Gutman | 2020-01-14 |
| 10474040 | Systems and methods for device-correlated overlay metrology | Ulrich Pohlmann, Stefan Eyring, Nadav Gutman | 2019-11-12 |
| 10473460 | Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signals | Nadav Gutman, Eran Amit, Stefan Eyring, Hari Pathangi, Ulrich Pohlmann +1 more | 2019-11-12 |
| 10337852 | Method for measuring positions of structures on a substrate and computer program product for determining positions of structures on a substrate | Oliver Ache | 2019-07-02 |
| 10303153 | Method and computer program product for controlling the positioning of patterns on a substrate in a manufacturing process | Slawomir Czerkas | 2019-05-28 |
| 10185800 | Apparatus and method for the measurement of pattern placement and size of pattern and computer program therefor | Stefan Eyring | 2019-01-22 |
| 10141156 | Measurement of overlay and edge placement errors with an electron beam column array | Mark A. Neil | 2018-11-27 |
| 9892885 | System and method for drift compensation on an electron beam based characterization tool | Christopher Sears | 2018-02-13 |
| 9704238 | Method for correcting position measurements for optical errors and method for determining mask writer errors | Stefan Eyring, Oliver Ache | 2017-07-11 |
| 9424636 | Method for measuring positions of structures on a mask and thereby determining mask manufacturing errors | Mohammad Mehdi Daneshpanah, Slawomir Czerkas, Mark Wagner | 2016-08-23 |
| 9201312 | Method for correcting position measurements for optical errors and method for determining mask writer errors | Stefan Eyring, Oliver Ache | 2015-12-01 |
| 8804137 | Unique mark and method to determine critical dimension uniformity and registration of reticles combined with wafer overlay capability | DongSub Choi, Amir Widmann, Zain Saidin, John Robinson | 2014-08-12 |
| 8352886 | Method for the reproducible determination of the position of structures on a mask with a pellicle frame | Christian Enkrich, Eric Cotte | 2013-01-08 |
| 7864319 | Device and method for determining an optical property of a mask | Hans-Artur Boesser, Michael Heiden, Klaus Rinn | 2011-01-04 |