| 8858766 |
Combinatorial high power coaxial switching matrix |
Kent Riley Child |
2014-10-14 |
| 8236133 |
Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension bias |
Dan Katz, David Palagashvili, Theodoros Panagopoulos, Valentin N. Todorow, Edward P. Hammond, IV +2 more |
2012-08-07 |
| 8066895 |
Method to control uniformity using tri-zone showerhead |
Rodolfo P. Belen, Edward P. Hammond, IV, Dan Katz, Alexander Paterson, Valentin N. Todorow |
2011-11-29 |
| 8017526 |
Gate profile control through effective frequency of dual HF/VHF sources in a plasma etch process |
Edward P. Hammond, IV, Rodolfo P. Belen, Alexander Paterson, Valentin N. Todorow, Dan Katz |
2011-09-13 |
| 7780864 |
Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution |
Alexander Paterson, Valentin N. Todorow, Theodoros Panagopoulos, Dan Katz, Edward P. Hammond, IV +2 more |
2010-08-24 |
| 7777152 |
High AC current high RF power AC-RF decoupling filter for plasma reactor heated electrostatic chuck |
Valentin Todorov, Michael D. Willwerth, Alexander Paterson, James E. Sammons, III, John Holland |
2010-08-17 |
| 7727413 |
Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion density |
Alexander Paterson, Valentin N. Todorow, Theodoros Panagopoulos, Dan Katz, Edward P. Hammond, IV +2 more |
2010-06-01 |
| 7674394 |
Plasma process for inductively coupling power through a gas distribution plate while adjusting plasma distribution |
Alexander Paterson, Valentin Todorov, Theodoros Panagopoulos, Dan Katz, Edward P. Hammond, IV +1 more |
2010-03-09 |
| 7645357 |
Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency |
Alexander Paterson, Valentin N. Todorow, Theodoros Panagopoulos, Dan Katz, Edward P. Hammond, IV +2 more |
2010-01-12 |
| 7264688 |
Plasma reactor apparatus with independent capacitive and toroidal plasma sources |
Alexander Paterson, Valentin N. Todorow, Theodoros Panagopoulos, Dan Katz, Edward P. Hammond, IV +2 more |
2007-09-04 |
| 6379575 |
Treatment of etching chambers using activated cleaning gas |
Gerald Yin, Xue-Yu Qian, Patrick Leahey, Jonathan D. Mohn, Waiching Chow +2 more |
2002-04-30 |
| 6367410 |
Closed-loop dome thermal control apparatus for a semiconductor wafer processing system |
Patrick Leahey, Jerry Chen, Richard E. Remington, Simon Yavelberg, Timothy D. Driscoll +3 more |
2002-04-09 |
