AV

Andrei Veldman

KL Kla-Tencor: 16 patents #97 of 1,394Top 7%
KL Kla: 6 patents #58 of 758Top 8%
Applied Materials: 1 patents #4,780 of 7,310Top 70%
Overall (All Time): #178,821 of 4,157,543Top 5%
23
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
12320763 Full beam metrology for x-ray scatterometry systems Antonio Arion Gellineau, Thaddeus Gerard Dziura, John J. Hench, Sergey Zalubovsky 2025-06-03
11913874 Optical metrology tool equipped with modulated illumination sources Andrei V. Shchegrov, Lawrence D. Rotter, David Y. Wang, Kevin Peterlinz, Gregory Brady +1 more 2024-02-27
11313816 Full beam metrology for x-ray scatterometry systems Antonio Arion Gellineau, Thaddeus Gerard Dziura, John J. Hench, Sergey Zalubovsky 2022-04-26
11099137 Visualization of three-dimensional semiconductor structures Aaron Rosenberg, Jonathan Iloreta, Thaddeus Gerard Dziura, Antonio Arion Gellineau, Yin Xu +5 more 2021-08-24
11086288 Optimizing computational efficiency by multiple truncation of spatial harmonics 2021-08-10
11073487 Methods and systems for characterization of an x-ray beam with high spatial resolution Alexander N. Bykanov, Nikolay Artemiev, Joseph A. Di Regolo, Antonio Arion Gellineau, Alexander Kuznetsov +1 more 2021-07-27
10969328 Optical metrology tool equipped with modulated illumination sources Andrei V. Shchegrov, Lawrence D. Rotter, David Y. Wang, Kevin Peterlinz, Gregory Brady +1 more 2021-04-06
10794839 Visualization of three-dimensional semiconductor structures Aaron Rosenberg, Jonathan Iloreta, Thaddeus Gerard Dziura, Antonio Arion Gellineau, Yin Xu +5 more 2020-10-06
10775323 Full beam metrology for X-ray scatterometry systems Antonio Arion Gellineau, Thaddeus Gerard Dziura, John J. Hench, Sergey Zalubovsky 2020-09-15
10712145 Hybrid metrology for patterned wafer characterization Boxue Chen, Alexander Kuznetsov, Andrei V. Shchegrov 2020-07-14
10677586 Phase revealing optical and X-ray semiconductor metrology John J. Hench 2020-06-09
10215688 Optical metrology tool equipped with modulated illumination sources Andrei V. Shchegrov, Lawrence D. Rotter, David Y. Wang, Kevin Peterlinz, Gregory Brady +1 more 2019-02-26
10185303 Optimizing computational efficiency by multiple truncation of spatial harmonics 2019-01-22
9885962 Methods and apparatus for measuring semiconductor device overlay using X-ray metrology Michael S. Bakeman, Andrei V. Shchegrov, Walter D. Mieher 2018-02-06
9523800 Computation efficiency by iterative spatial harmonics order truncation John J. Hench 2016-12-20
9400246 Optical metrology tool equipped with modulated illumination sources Andrei V. Shchegrov, Lawrence D. Rotter, David Y. Wang, Kevin Peterlinz, Gregory Brady +1 more 2016-07-26
9255877 Metrology system optimization for parameter tracking Andrei V. Shchegrov, Gregory Brady, Thaddeus Gerard Dziura, Stilian Ivanov Pandev, Alexander Kuznetsov 2016-02-09
8798966 Measuring critical dimensions of a semiconductor structure John J. Hench, Daniel Wack, Edward Ratner, Yaoming SHI 2014-08-05
8760649 Model-based metrology using tesselation-based discretization John J. Hench 2014-06-24
7826072 Method for optimizing the configuration of a scatterometry measurement system Daniel Wack, Edward Ratner, John J. Hench, Noah Bareket 2010-11-02
7716003 Model-based measurement of semiconductor device features with feed forward use of data for dimensionality reduction Daniel Wack, Edward Ratner, John J. Hench, Noah Bareket 2010-05-11
7480047 Time-domain computation of scattering spectra for use in spectroscopic metrology Edward Ratner, Daniel Wack 2009-01-20
6303931 Method for determining a profile quality grade of an inspected feature Mina Menaker 2001-10-16