Issued Patents All Time
Showing 51–75 of 93 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10636700 | Metal via processing schemes with via critical dimension (CD) control for back end of line (BEOL) interconnects and the resulting structures | Paul A. Nyhus, Mohit K. HARAN, Robert M. Bigwood, Deepak S. Rao, Alexander F. Kaplan | 2020-04-28 |
| 10607884 | Gate aligned contact and method to fabricate same | Oleg Golonzka, Swaminathan Sivakumar, Tahir Ghani | 2020-03-31 |
| 10600678 | Self-aligned isotropic etch of pre-formed vias and plugs for back end of line (BEOL) interconnects | Elliot N. Tan, Paul A. Nyhus, Swaminathan Sivakumar | 2020-03-24 |
| 10559529 | Pitch division patterning approaches with increased overlay margin for back end of line (BEOL) interconnect fabrication and structures resulting therefrom | Leonard P. GULER, Manish Chandhok, Paul A. Nyhus | 2020-02-11 |
| 10490519 | Pattern decomposition lithography techniques | Hossam A. Abdallah, Elliot N. Tan, Swaminathan Sivakumar, Oleg Golonzka, Robert M. Bigwood | 2019-11-26 |
| 10409152 | Pattern decomposition lithography techniques | Hossam A. Abdallah, Elliot N. Tan, Swaminathan Sivakumar, Oleg Golonzka, Robert M. Bigwood | 2019-09-10 |
| 10340185 | Gate aligned contact and method to fabricate same | Oleg Golonzka, Swaminathan Sivakumar, Tahir Ghani | 2019-07-02 |
| 10338474 | Underlying absorbing or conducting layer for Ebeam direct write (EBDW) lithography | Shakul Tandon, Yan Borodovsky, Paul A. Nyhus | 2019-07-02 |
| 10319625 | Metal via processing schemes with via critical dimension (CD) control for back end of line (BEOL) interconnects and the resulting structures | Paul A. Nyhus, Mohit K. HARAN, Robert M. Bigwood, Deepak S. Rao, Alexander F. Kaplan | 2019-06-11 |
| 10297467 | Self-aligned via and plug patterning for back end of line (BEOL) interconnects | Paul A. Nyhus | 2019-05-21 |
| 10211088 | Self-aligned isotropic etch of pre-formed vias and plugs for back end of line (BEOL) interconnects | Elliot N. Tan, Paul A. Nyhus, Swaminathan Sivakumar | 2019-02-19 |
| 10204830 | Previous layer self-aligned via and plug patterning for back end of line (BEOL) interconnects | Paul A. Nyhus, Elliot N. Tan, Swaminathan Sivakumar | 2019-02-12 |
| 9793163 | Subtractive self-aligned via and plug patterning for back end of line (BEOL) interconnects | Robert L. Bristol, Florian Gstrein, Richard E. Schenker, Paul A. Nyhus, Hui Jae Yoo | 2017-10-17 |
| 9793159 | Previous layer self-aligned via and plug patterning for back end of line (BEOL) interconnects | Paul A. Nyhus, Elliot N. Tan, Swaminathan Sivakumar | 2017-10-17 |
| 9716037 | Gate aligned contact and method to fabricate same | Oleg Golonzka, Swaminathan Sivakumar, Tahir Ghani | 2017-07-25 |
| 9679845 | Necked interconnect fuse structure for integrated circuits | Zhanping Chen, Andrew W. Yeoh, Seongtae Jeong, Uddalak Bhattacharya | 2017-06-13 |
| 9666451 | Self-aligned via and plug patterning for back end of line (BEOL) interconnects | Paul A. Nyhus | 2017-05-30 |
| 9666442 | Methods for single exposure—self-aligned double, triple, and quadruple patterning | Fitih M. Cinnor | 2017-05-30 |
| 9558947 | Pattern decomposition lithography techniques | Hossam M. Abdallah, Elliot N. Tan, Swaminathan Sivakumar, Oleg Golonzka, Robert M. Bigwood | 2017-01-31 |
| 9285682 | Pre-patterned hard mask for ultrafast lithographic imaging | Robert L. Bristol, Paul A. Nyhus | 2016-03-15 |
| 9224602 | Sub-second annealing lithography techniques | Aravind S. Killampalli, Bernhard Sell | 2015-12-29 |
| 9142421 | Double patterning lithography techniques | Swaminathan Sivakumar, Matthew Tingey, Chanaka D. Munasinghe, Nadia M. Rahhal-Orabi | 2015-09-22 |
| 9046761 | Lithography mask having sub-resolution phased assist features | Shem Ogadhoh, Ryan Pearman, Sven Henrichs, Arvind Sundaramurthy, Swaminathan Sivakumar | 2015-06-02 |
| 9005875 | Pre-patterned hard mask for ultrafast lithographic imaging | Robert L. Bristol, Paul A. Nyhus | 2015-04-14 |
| 8980757 | Methods for single exposure—self-aligned double, triple, and quadruple patterning | Fitih M. Cinnor | 2015-03-17 |