Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12243712 | Method and system for determining a charged particle beam exposure for a local pattern density | Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie | 2025-03-04 |
| 11886166 | Method and system of reducing charged particle beam write time | Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie | 2024-01-30 |
| 11756765 | Method and system for determining a charged particle beam exposure for a local pattern density | Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie | 2023-09-12 |
| 11604451 | Method and system of reducing charged particle beam write time | Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie | 2023-03-14 |
| 11592802 | Method and system of reducing charged particle beam write time | Akira Fujimura, Harold Robert Zable, Nagesh Shirali, William E. Guthrie | 2023-02-28 |
| 11062878 | Method and system for determining a charged particle beam exposure for a local pattern density | Akira Fujimura, Harold Robert Zable, Nagesh Shirali, William E. Guthrie | 2021-07-13 |
| 10884395 | Method and system of reducing charged particle beam write time | Akira Fujimura, Harold Robert Zable, Nagesh Shirali, William E. Guthrie | 2021-01-05 |
| 10748744 | Method and system for determining a charged particle beam exposure for a local pattern density | Akira Fujimura, Harold Robert Zable, Nagesh Shirali, William E. Guthrie | 2020-08-18 |
| 10460071 | Shaped beam lithography including temperature effects | Akira Fujimura, Harold Robert Zable, William E. Guthrie | 2019-10-29 |
| 9104109 | Method and system for improving critical dimension uniformity using shaped beam lithography | Akira Fujimura, Anatoly Aadamov | 2015-08-11 |
| 9046761 | Lithography mask having sub-resolution phased assist features | Shem Ogadhoh, Charles H. Wallace, Sven Henrichs, Arvind Sundaramurthy, Swaminathan Sivakumar | 2015-06-02 |
| 9038003 | Method and system for critical dimension uniformity using charged particle beam lithography | Robert C. Pack, Akira Fujimura | 2015-05-19 |