| 12243712 |
Method and system for determining a charged particle beam exposure for a local pattern density |
Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie |
2025-03-04 |
| 11886166 |
Method and system of reducing charged particle beam write time |
Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie |
2024-01-30 |
| 11756765 |
Method and system for determining a charged particle beam exposure for a local pattern density |
Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie |
2023-09-12 |
| 11604451 |
Method and system of reducing charged particle beam write time |
Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie |
2023-03-14 |
| 11592802 |
Method and system of reducing charged particle beam write time |
Akira Fujimura, Harold Robert Zable, Nagesh Shirali, William E. Guthrie |
2023-02-28 |
| 11062878 |
Method and system for determining a charged particle beam exposure for a local pattern density |
Akira Fujimura, Harold Robert Zable, Nagesh Shirali, William E. Guthrie |
2021-07-13 |
| 10884395 |
Method and system of reducing charged particle beam write time |
Akira Fujimura, Harold Robert Zable, Nagesh Shirali, William E. Guthrie |
2021-01-05 |
| 10748744 |
Method and system for determining a charged particle beam exposure for a local pattern density |
Akira Fujimura, Harold Robert Zable, Nagesh Shirali, William E. Guthrie |
2020-08-18 |
| 10460071 |
Shaped beam lithography including temperature effects |
Akira Fujimura, Harold Robert Zable, William E. Guthrie |
2019-10-29 |
| 9104109 |
Method and system for improving critical dimension uniformity using shaped beam lithography |
Akira Fujimura, Anatoly Aadamov |
2015-08-11 |
| 9046761 |
Lithography mask having sub-resolution phased assist features |
Shem Ogadhoh, Charles H. Wallace, Sven Henrichs, Arvind Sundaramurthy, Swaminathan Sivakumar |
2015-06-02 |
| 9038003 |
Method and system for critical dimension uniformity using charged particle beam lithography |
Robert C. Pack, Akira Fujimura |
2015-05-19 |