Issued Patents All Time
Showing 25 most recent of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12243712 | Method and system for determining a charged particle beam exposure for a local pattern density | Akira Fujimura, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman | 2025-03-04 |
| 11886166 | Method and system of reducing charged particle beam write time | Akira Fujimura, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman | 2024-01-30 |
| 11756765 | Method and system for determining a charged particle beam exposure for a local pattern density | Akira Fujimura, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman | 2023-09-12 |
| 11604451 | Method and system of reducing charged particle beam write time | Akira Fujimura, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman | 2023-03-14 |
| 11592802 | Method and system of reducing charged particle beam write time | Akira Fujimura, Nagesh Shirali, William E. Guthrie, Ryan Pearman | 2023-02-28 |
| 11126085 | Bias correction for lithography | — | 2021-09-21 |
| 11062878 | Method and system for determining a charged particle beam exposure for a local pattern density | Akira Fujimura, Nagesh Shirali, William E. Guthrie, Ryan Pearman | 2021-07-13 |
| 10884395 | Method and system of reducing charged particle beam write time | Akira Fujimura, Nagesh Shirali, William E. Guthrie, Ryan Pearman | 2021-01-05 |
| 10748744 | Method and system for determining a charged particle beam exposure for a local pattern density | Akira Fujimura, Nagesh Shirali, William E. Guthrie, Ryan Pearman | 2020-08-18 |
| 10725383 | Bias correction for lithography | — | 2020-07-28 |
| 10460071 | Shaped beam lithography including temperature effects | Akira Fujimura, Ryan Pearman, William E. Guthrie | 2019-10-29 |
| 10444629 | Bias correction for lithography | — | 2019-10-15 |
| 9625809 | Method and system for forming patterns using charged particle beam lithography with variable pattern dosage | Akira Fujimura | 2017-04-18 |
| 9372391 | Method and system for forming patterns using charged particle beam lithography with variable pattern dosage | Akira Fujimura | 2016-06-21 |
| 8895212 | Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes with different dosages | Akira Fujimura | 2014-11-25 |
| 8883375 | Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes | Akira Fujimura | 2014-11-11 |
| 8771906 | Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area | Akira Fujimura | 2014-07-08 |
| 8592108 | Method for design and manufacture of patterns with variable shaped beam lithography | Akira Fujimura | 2013-11-26 |
| 8492055 | Method and system for fracturing a pattern using lithography with multiple exposure passes | Akira Fujimura | 2013-07-23 |
| 8329365 | Method for design and manufacture of diagonal patterns with variable shaped beam lithography | Akira Fujimura | 2012-12-11 |
| 8221940 | Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes | Akira Fujimura | 2012-07-17 |
| 8221939 | Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes having different dosages | Akira Fujimura | 2012-07-17 |
| 8137871 | Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area | Akira Fujimura | 2012-03-20 |
| 8062813 | Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography | Akira Fujimura | 2011-11-22 |
| 8017286 | Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography | Akira Fujimura | 2011-09-13 |