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USPTO Patent Rankings Data through Dec 31, 2025
Home › D2S › Akira Fujimura
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Akira Fujimura — 164 Patents

D2D2S: 98 patents #1 of 39Top 3%
CSCadence Design Systems: 22 patents #30 of 2,263Top 2%
Honda Motor Co.: 20 patents #634 of 21,052Top 4%
NTNtn: 14 patents #110 of 1,364Top 9%
HKHonda Giken Kogyo K.K.: 3 patents #24 of 311Top 8%
NCNippon Electric Co.: 1 patents #251 of 792Top 35%
CSCandence Design Systems: 1 patents #1 of 20Top 5%
Saratoga, CA: #25 of 2,933 inventorsTop 1%
California: #845 of 386,348 inventorsTop 1%
Overall (All Time): #5,159 of 4,157,543Top 1%
164 Patents All Time
Akira Fujimura has been granted 164 US patents while listed as an inventor at D2S. The first was granted in 1982 and the most recent in December 2025. Akira Fujimura ranks #5,159 of 4,157,543 US inventors in our database (top 0.12%). Patent records list Akira Fujimura in Saratoga, CA, US.

Issued Patents All Time

Showing 1–25 of 164 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
12499301 Computing parasitic values for semiconductor designs Nagesh Shirali, Donald Oriordan 2025-12-16
12488175 Methods and systems to determine parasitics for semiconductor or flat panel display fabrication Nagesh Shirali, Donald Oriordan 2025-12-02
12475283 Generating and display an animation of a predicted overlap shape in an IC design Donald Oriordan, George Janac 2025-11-18
12387029 Computing parasitic values for semiconductor designs Nagesh Shirali, Donald Oriordan 2025-08-12
12372864 Methods and systems to determine shapes for semiconductor or flat panel display fabrication Nagesh Shirali, Donald Oriordan 2025-07-29
12340164 Methods and systems for reticle enhancement technology of a design pattern to be manufactured on a substrate P. Jeffrey Ungar, Nagesh Shirali 2025-06-24
12287567 Method and system for reticle enhancement technology Nagesh Shirali, Ajay Baranwal 2025-04-29
12248242 Methods and systems for reticle enhancement technology of a design pattern to be manufactured on a substrate P. Jeffrey Ungar, Nagesh Shirali 2025-03-11
12243712 Method and system for determining a charged particle beam exposure for a local pattern density Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman 2025-03-04
12019973 Method for reticle enhancement technology of a design pattern to be manufactured on a substrate P. Jeffrey Ungar, Nagesh Shirali 2024-06-25
11953824 Method for reticle enhancement technology of a design pattern to be manufactured on a substrate P. Jeffrey Ungar, Nagesh Shirali 2024-04-09
11921420 Method and system for reticle enhancement technology Nagesh Shirali, Ajay Baranwal 2024-03-05
11886166 Method and system of reducing charged particle beam write time Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman 2024-01-30
11783110 Method for reticle enhancement technology of a design pattern to be manufactured on a substrate P. Jeffrey Ungar, Nagesh Shirali 2023-10-10
11756765 Method and system for determining a charged particle beam exposure for a local pattern density Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman 2023-09-12
11693306 Method for reticle enhancement technology of a design pattern to be manufactured on a substrate P. Jeffrey Ungar, Nagesh Shirali 2023-07-04
11604451 Method and system of reducing charged particle beam write time Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman 2023-03-14
11592802 Method and system of reducing charged particle beam write time Harold Robert Zable, Nagesh Shirali, William E. Guthrie, Ryan Pearman 2023-02-28
11264206 Methods and systems for forming a pattern on a surface using multi-beam charged particle beam lithography Thang Nguyen, Ajay Baranwal, Michael Meyer, Suhas Pillai 2022-03-01
11062878 Method and system for determining a charged particle beam exposure for a local pattern density Harold Robert Zable, Nagesh Shirali, William E. Guthrie, Ryan Pearman 2021-07-13
10884395 Method and system of reducing charged particle beam write time Harold Robert Zable, Nagesh Shirali, William E. Guthrie, Ryan Pearman 2021-01-05
10748744 Method and system for determining a charged particle beam exposure for a local pattern density Harold Robert Zable, Nagesh Shirali, William E. Guthrie, Ryan Pearman 2020-08-18
10460071 Shaped beam lithography including temperature effects Harold Robert Zable, Ryan Pearman, William E. Guthrie 2019-10-29
10431422 Method and system for dimensional uniformity using charged particle beam lithography Kazuyuki Hagiwara, Robert C. Pack 2019-10-01
10317790 Sub-resolution assist features in semiconductor pattern writing Leo Hok Lai Pang 2019-06-11

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Chenming Hu164
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Young Woo Park164
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Sung-Chul Kim164
Richard A. Johnson164
Chun-Hung Chen164