AF

Akira Fujimura

D2 D2S: 98 patents #1 of 39Top 3%
CS Cadence Design Systems: 22 patents #30 of 2,263Top 2%
Honda Motor Co.: 20 patents #634 of 21,052Top 4%
NT Ntn: 14 patents #110 of 1,364Top 9%
HK Honda Giken Kogyo K.K.: 3 patents #24 of 311Top 8%
NC Nippon Electric Co.: 1 patents #251 of 792Top 35%
CS Candence Design Systems: 1 patents #1 of 20Top 5%
Overall (All Time): #5,317 of 4,157,543Top 1%
161
Patents All Time

Issued Patents All Time

Showing 25 most recent of 161 patents

Patent #TitleCo-InventorsDate
12387029 Computing parasitic values for semiconductor designs Nagesh Shirali, Donald Oriordan 2025-08-12
12372864 Methods and systems to determine shapes for semiconductor or flat panel display fabrication Nagesh Shirali, Donald Oriordan 2025-07-29
12340164 Methods and systems for reticle enhancement technology of a design pattern to be manufactured on a substrate P. Jeffrey Ungar, Nagesh Shirali 2025-06-24
12287567 Method and system for reticle enhancement technology Nagesh Shirali, Ajay Baranwal 2025-04-29
12248242 Methods and systems for reticle enhancement technology of a design pattern to be manufactured on a substrate P. Jeffrey Ungar, Nagesh Shirali 2025-03-11
12243712 Method and system for determining a charged particle beam exposure for a local pattern density Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman 2025-03-04
12019973 Method for reticle enhancement technology of a design pattern to be manufactured on a substrate P. Jeffrey Ungar, Nagesh Shirali 2024-06-25
11953824 Method for reticle enhancement technology of a design pattern to be manufactured on a substrate P. Jeffrey Ungar, Nagesh Shirali 2024-04-09
11921420 Method and system for reticle enhancement technology Nagesh Shirali, Ajay Baranwal 2024-03-05
11886166 Method and system of reducing charged particle beam write time Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman 2024-01-30
11783110 Method for reticle enhancement technology of a design pattern to be manufactured on a substrate P. Jeffrey Ungar, Nagesh Shirali 2023-10-10
11756765 Method and system for determining a charged particle beam exposure for a local pattern density Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman 2023-09-12
11693306 Method for reticle enhancement technology of a design pattern to be manufactured on a substrate P. Jeffrey Ungar, Nagesh Shirali 2023-07-04
11604451 Method and system of reducing charged particle beam write time Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman 2023-03-14
11592802 Method and system of reducing charged particle beam write time Harold Robert Zable, Nagesh Shirali, William E. Guthrie, Ryan Pearman 2023-02-28
11264206 Methods and systems for forming a pattern on a surface using multi-beam charged particle beam lithography Thang Nguyen, Ajay Baranwal, Michael Meyer, Suhas Pillai 2022-03-01
11062878 Method and system for determining a charged particle beam exposure for a local pattern density Harold Robert Zable, Nagesh Shirali, William E. Guthrie, Ryan Pearman 2021-07-13
10884395 Method and system of reducing charged particle beam write time Harold Robert Zable, Nagesh Shirali, William E. Guthrie, Ryan Pearman 2021-01-05
10748744 Method and system for determining a charged particle beam exposure for a local pattern density Harold Robert Zable, Nagesh Shirali, William E. Guthrie, Ryan Pearman 2020-08-18
10460071 Shaped beam lithography including temperature effects Harold Robert Zable, Ryan Pearman, William E. Guthrie 2019-10-29
10431422 Method and system for dimensional uniformity using charged particle beam lithography Kazuyuki Hagiwara, Robert C. Pack 2019-10-01
10317790 Sub-resolution assist features in semiconductor pattern writing Leo Hok Lai Pang 2019-06-11
10290467 Method and system for forming a pattern on a surface using multi-beam charged particle beam lithography 2019-05-14
10101648 Method and system for forming a pattern on a reticle using charged particle beam lithography 2018-10-16
10031413 Method and system for forming patterns using charged particle beam lithography Anatoly Aadamov, Eldar Khaliullin, Ingo Bork 2018-07-24