Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10431422 | Method and system for dimensional uniformity using charged particle beam lithography | Akira Fujimura, Robert C. Pack | 2019-10-01 |
| 9859100 | Method and system for dimensional uniformity using charged particle beam lithography | Akira Fujimura, Robert C. Pack | 2018-01-02 |
| 9612530 | Method and system for design of enhanced edge slope patterns for charged particle beam lithography | Akira Fujimura, Stephen F. Meier, Ingo Bork | 2017-04-04 |
| 9343267 | Method and system for dimensional uniformity using charged particle beam lithography | Akira Fujimura, Robert C. Pack | 2016-05-17 |
| 9057956 | Method and system for design of enhanced edge slope patterns for charged particle beam lithography | Akira Fujimura, Stephen F. Meier, Ingo Bork | 2015-06-16 |
| 9047693 | Color distribution design assistance system | Takashi Adachi, Osamu Watabe, Yuri Kakihara, Masayuki Osumi | 2015-06-02 |
| 9043734 | Method and system for forming high accuracy patterns using charged particle beam lithography | Akira Fujimura, Stephen F. Meier, Ingo Bork | 2015-05-26 |
| 8959463 | Method and system for dimensional uniformity using charged particle beam lithography | Akira Fujimura, Robert C. Pack, Anatoly Aadamov | 2015-02-17 |
| 8949750 | Method and system for forming a diagonal pattern using charged particle beam lithography | Etienne Jacques, Jin Choi | 2015-02-03 |
| 8865377 | Method and system for forming a diagonal pattern using charged particle beam lithography | Etienne Jacques, Jin Choi | 2014-10-21 |
| 8473875 | Method and system for forming high accuracy patterns using charged particle beam lithography | Akira Fujimura, Stephen F. Meier, Ingo Bork | 2013-06-25 |
| 8431914 | Method and system for manufacturing a surface using charged particle beam lithography with variable beam blur | Akira Fujimura | 2013-04-30 |
| 7901845 | Method for optical proximity correction of a reticle to be manufactured using character projection lithography | Akira Fujimura, Lance Glasser, Takashi Mitsuhashi | 2011-03-08 |
| 7759026 | Method and system for manufacturing a reticle using character projection particle beam lithography | Akira Fujimura, Lance Glasser, Takashi Mitsuhashi | 2010-07-20 |
| 7759027 | Method and system for design of a reticle to be manufactured using character projection lithography | Akira Fujimura, Lance Glasser, Takashi Mitsuhashi | 2010-07-20 |
| 7745078 | Method and system for manufacturing a reticle using character projection lithography | Akira Fujimura, Lance Glasser, Takashi Mitsuhashi | 2010-06-29 |