Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12426247 | Capacitor connections in dielectric layers | Travis W. Lajoie, Abhishek A. Sharma, Van H. Le, Chieh-Jen Ku, Pei-Hua Wang +13 more | 2025-09-23 |
| 12176284 | Through plate interconnect for a vertical MIM capacitor | Travis W. Lajoie, Abhishek A. Sharma, Juan G. Alzate-Vinasco, Chieh-Jen Ku, Allen B. Gardiner +6 more | 2024-12-24 |
| 12080643 | Integrated circuit structures having differentiated interconnect lines in a same dielectric layer | Travis W. Lajoie, Abhishek A. Sharma, Juan G. Alzate Vinasco, Chieh-Jen Ku, Allen B. Gardiner +6 more | 2024-09-03 |
| 11991873 | Capacitor separations in dielectric layers | Travis W. Lajoie, Abhishek A. Sharma, Van H. Le, Chieh-Jen Ku, Pei-Hua Wang +13 more | 2024-05-21 |
| 11832438 | Capacitor connections in dielectric layers | Travis W. Lajoie, Abhishek A. Sharma, Van H. Le, Chieh-Jen Ku, Pei-Hua Wang +13 more | 2023-11-28 |
| 11652047 | Intermediate separation layers at the back-end-of-line | Travis W. Lajoie, Abhishek A. Sharma, Van H. Le, Chieh-Jen Ku, Pei-Hua Wang +13 more | 2023-05-16 |
| 11610894 | Capacitor separations in dielectric layers | Travis W. Lajoie, Abhishek A. Sharma, Van H. Le, Chieh-Jen Ku, Pei-Hua Wang +13 more | 2023-03-21 |
| 11581162 | Fill pattern to enhance ebeam process margin | Shakul Tandon, Mark C. Phillips, John A. Swanson | 2023-02-14 |
| 11563107 | Method of contact patterning of thin film transistors for embedded DRAM using a multi-layer hardmask | Chieh-Jen Ku, Bernhard Sell, Pei-Hua Wang, Nikhil MEHTA, Shu Zhou +5 more | 2023-01-24 |
| 11404536 | Thin-film transistor structures with gas spacer | Travis W. Lajoie, Abhishek A. Sharma, Juan G. Alzate-Vinasco, Chieh-Jen Ku, Allen B. Gardiner +6 more | 2022-08-02 |
| 11121073 | Through plate interconnect for a vertical MIM capacitor | Travis W. Lajoie, Abhishek A. Sharma, Juan G. Alzate-Vinasco, Chieh-Jen Ku, Allen B. Gardiner +6 more | 2021-09-14 |
| 11107658 | Fill pattern to enhance e-beam process margin | Shakul Tandon, Mark C. Phillips, John A. Swanson | 2021-08-31 |
| 9046761 | Lithography mask having sub-resolution phased assist features | Charles H. Wallace, Ryan Pearman, Sven Henrichs, Arvind Sundaramurthy, Swaminathan Sivakumar | 2015-06-02 |
| 8959465 | Techniques for phase tuning for process optimization | Paul A. Nyhus, Swaminathan Sivakumar, Seongtae Jeong | 2015-02-17 |
| 8778605 | Mask design and OPC for device manufacture | Raguraman Venkatesan, Kevin Hooker, Sungwon Kim, Bin Hu, Vivek Singh +3 more | 2014-07-15 |
| 8404403 | Mask design and OPC for device manufacture | Raguraman Venkatesan, Kevin Hooker, Sungwon Kim, Bin Hu, Vivek Singh +3 more | 2013-03-26 |
| 8399157 | Lithography mask having sub-resolution phased assist features | — | 2013-03-19 |
| 7470492 | Process window-based correction for photolithography masks | Robert M. Bigwood, Joseph E. Brandenburg | 2008-12-30 |