| 7193023 |
Low activation energy photoresists |
Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Ratnam Sooriyakumaran, Hoa D. Truong +1 more |
2007-03-20 |
| 7141692 |
Molecular photoresists containing nonpolymeric silsesquioxanes |
Wu-Song Huang, Mahmoud Khojasteh, Qinghuang Lin, Dirk Pfeiffer, Ratnam Sooriyakumaran +1 more |
2006-11-28 |
| 7135595 |
Photoresist composition |
Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Debra Fenzel-Alexander, Carl E. Larson +5 more |
2006-11-14 |
| 7014980 |
Photoresist composition |
Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Debra Fenzel-Alexander, Carl E. Larson +5 more |
2006-03-21 |
| 6939664 |
Low-activation energy silicon-containing resist system |
Wu-Song Huang, Marie Angelopoulos, Ranee W. Kwong, Ratnam Sooriyakumaran |
2005-09-06 |
| 6927015 |
Underlayer compositions for multilayer lithographic processes |
Mahmoud Khojasteh, Timothy Hughes, Ranee W. Kwong, Pushkara R. Varanasi, William R. Brunsvold +4 more |
2005-08-09 |
| 6818381 |
Underlayer compositions for multilayer lithographic processes |
Mahmoud Khojasteh, Timothy Hughes, Ranee W. Kwong, Pushkara R. Varanasi, William R. Brunsvold +4 more |
2004-11-16 |
| 6806026 |
Photoresist composition |
Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Debra Fenzel-Alexander, Carl E. Larson +5 more |
2004-10-19 |
| 6794459 |
Modified polycyclic polymers |
Saikumar Jayaraman, George M. Benedikt, Larry F. Rhodes, Richard Vicari, Richard Anthony DiPietro +2 more |
2004-09-21 |
| 6770419 |
Low silicon-outgassing resist for bilayer lithography |
Mahmoud Khojasteh, Ranee W. Kwong, Kuang-Jung Chen, Pushkara R. Varanasi, Phillip Brock +2 more |
2004-08-03 |
| 6723486 |
Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
Brian L. Goodall, Saikumar Jayaraman, Robert A. Shick, Larry F. Rhodes, Richard Anthony DiPietro +1 more |
2004-04-20 |
| RE38282 |
Process for using bilayer photoresist |
Donald C. Hofer, Ratnam Sooriyakumaran, Gregory Michael Wallraff |
2003-10-21 |
| 6610456 |
Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositions |
Phillip Brock, Hiroshi Ito, Gregory Michael Wallraff |
2003-08-26 |
| 6525153 |
Polycyclic polymers containing pendant cyclic anhydride groups |
Saikumar Jayaraman, Brian L. Goodall, Richard Vicari, John-Henry Lipian, Juliann Opitz +1 more |
2003-02-25 |
| 6451499 |
Polycyclic resist compositions with increased etch resistance |
Saikumar Jayaraman, Brian L. Goodall, Larry F. Rhodes, Robert A. Shick, Richard Vicari +3 more |
2002-09-17 |
| 6451945 |
Modified polycyclic polymers |
Saikumar Jayaraman, George M. Benedikt, Larry F. Rhodes, Richard Vicari, Richard Anthony DiPietro +2 more |
2002-09-17 |
| 6420503 |
Norbornene sulfonamide polymers |
Saikumar Jayaraman, Richard Vicari, Larry F. Rhodes, Pushkara R. Varanasi, Thomas I. Wallow +4 more |
2002-07-16 |
| 6251560 |
Photoresist compositions with cyclic olefin polymers having lactone moiety |
Thomas I. Wallow, Phillip Brock, Richard Anthony DiPietro, Hiroshi Ito, Hoa D. Truong +1 more |
2001-06-26 |
| 6180317 |
Composition for photoimaging |
Richard A. Day, Donald Herman Glatzel, William D. Hinsberg, John R. Mertz, David J. Russell +1 more |
2001-01-30 |
| 6177228 |
Photoresist composition and process for its use |
Richard Anthony DiPietro, Ratnam Sooriyakumaran, Thomas I. Wallow, Gregory Michael Wallraff |
2001-01-23 |
| 6165673 |
Resist composition with radiation sensitive acid generator |
Gregory Breyta, Richard Anthony DiPietro, Donald C. Hofer, Hiroshi Ito, Juliann Opitz +1 more |
2000-12-26 |
| 6165678 |
Lithographic photoresist composition and process for its use in the manufacture of integrated circuits |
Richard Anthony DiPietro, Ratnam Sooriyakumaran, Thomas I. Wallow, Gregory Michael Wallraff |
2000-12-26 |
| 6147177 |
Polycyclic resist compositions with increased etch resistance |
Saikumar Jayaraman, Brian L. Goodall, Larry F. Rhodes, Robert A. Shick, Richard Vicari +3 more |
2000-11-14 |
| 6003817 |
Actively controlled thermal panel and method therefor |
Sibnath Basuthakur, David Paul Bonello |
1999-12-21 |
| 5985524 |
Process for using bilayer photoresist |
Donald C. Hofer, Ratnam Sooriyakumaran, Gregory Michael Wallraff |
1999-11-16 |
