RA

Robert David Allen

IBM: 102 patents #541 of 70,183Top 1%
TA Taclov: 4 patents #2 of 4Top 50%
SC Sumitomo Bakelite Co.: 4 patents #87 of 790Top 15%
ST Siga Technologies: 3 patents #19 of 32Top 60%
BG B. F. Goodrich: 3 patents #166 of 734Top 25%
Motorola: 2 patents #4,475 of 12,470Top 40%
CL Central Glass Company, Limited: 2 patents #334 of 968Top 35%
Globalfoundries: 2 patents #1,397 of 4,424Top 35%
AE Alliance For Sustainable Energy: 2 patents #186 of 746Top 25%
S( Subsea 7 (Us): 1 patents #6 of 12Top 50%
JS Jsr: 1 patents #649 of 1,137Top 60%
📍 Golden, CO: #1 of 1,256 inventorsTop 1%
🗺 Colorado: #61 of 40,980 inventorsTop 1%
Overall (All Time): #10,763 of 4,157,543Top 1%
115
Patents All Time

Issued Patents All Time

Showing 101–115 of 115 patents

Patent #TitleCo-InventorsDate
5962184 Photoresist composition comprising a copolymer of a hydroxystyrene and a (meth)acrylate substituted with an alicyclic ester substituent Ratnam Sooriyakumaran 1999-10-05
5954298 Active spacecraft thermal control system and method Sibnath Basuthakur, Daniel David Miller 1999-09-21
5786131 Process for use of photoresist composition with deep ultraviolet radiation Richard Anthony DiPietro, Gregory Michael Wallraff 1998-07-28
5747223 Composition for photoimaging Richard A. Day, Donald Herman Glatzel, William D. Hinsberg, John R. Mertz, David J. Russell +1 more 1998-05-05
5665527 Process for generating negative tone resist images utilizing carbon dioxide critical fluid Gregory Michael Wallraff 1997-09-09
5580694 Photoresist composition with androstane and process for its use Richard Anthony DiPietro, Gregory Michael Wallraff 1996-12-03
5372912 Radiation-sensitive resist composition and process for its use Jr. Conley, William D. Hinsberg, Pamela E. Jones, Kevin M. Welsh 1994-12-13
5272042 Positive photoresist system for near-UV to visible imaging William R. Brunsvold, Burton J. Carpenter, William D. Hinsberg, Joseph LaTorre, Michael G. McMaster +5 more 1993-12-21
5264325 Composition for photo imaging Richard A. Day, Donald Herman Glatzel, William D. Hinsberg, John R. Mertz, David J. Russell +1 more 1993-11-23
5250395 Process for imaging of photoresist including treatment of the photoresist with an organometallic compound Scott A. MacDonald, Dennis McKean, Hubert Schlosser, Robert J. Twieg, Gregory Michael Wallraff +1 more 1993-10-05
5071730 Liquid apply, aqueous processable photoresist compositions William D. Hinsberg, Logan L. Simpson, Gregory Michael Wallraff 1991-12-10
5055439 Photoacid generating composition and sensitizer therefor William D. Hinsberg, Logan L. Simpson, Robert J. Twieg, Gregory Michael Wallraff, Carlton G. Willson 1991-10-08
5045431 Dry film, aqueous processable photoresist compositions Gregory Michael Wallraff, Logan L. Simpson, William D. Hinsberg 1991-09-03
4810601 Top imaged resists Kaolin N. Chiong, Ming-Fea Chow, Scott A. MacDonald, Jer-Ming Yang, Carlton G. Willson 1989-03-07
4800152 Negative resist compositions Jean M. J. Frechet, Robert J. Twieg, Carlton G. Willson 1989-01-24