Issued Patents All Time
Showing 51–75 of 115 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8011517 | Composite membranes with performance enhancing layers | James L. Hedrick, Young-Hye Na, Alshakim Nelson, Ratnam Sooriyakumaran | 2011-09-06 |
| 7951524 | Self-topcoating photoresist for photolithography | Phillip Brock, Shiro Kusumoto, Yukio Nishimura, Daniel P. Sanders, Mark Steven Slezak +4 more | 2011-05-31 |
| 7944055 | Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structures | Phillip Brock, Blake Davis, Wu-Song Huang, Qinghuang Lin, Alshakim Nelson +2 more | 2011-05-17 |
| 7919225 | Photopatternable dielectric materials for BEOL applications and methods for use | Phillip Brock, Blake Davis, Geraud Jean-Michel Dubois, Qinghuang Lin, Robert D. Miller +3 more | 2011-04-05 |
| 7910290 | Photoresist topcoat for a photolithographic process | Ratnam Sooriyakumaran, Linda Karin Sundberg | 2011-03-22 |
| 7901868 | Photoresist topcoat for a photolithographic process | Rutnam Sooriyakumaran, Linda Karin Sundberg | 2011-03-08 |
| 7883828 | Functionalized carbosilane polymers and photoresist compositions containing the same | Matthew E. Colburn, Daniel P. Sanders, Ratnam Sooriyakumaran, Hoa D. Truong | 2011-02-08 |
| 7867689 | Method of use for photopatternable dielectric materials for BEOL applications | Phillip Brock, Blake Davis, Qinghuang Lin, Robert D. Miller, Alshakim Nelson +1 more | 2011-01-11 |
| 7855045 | Immersion topcoat materials with improved performance | Phillip Brock, Dario Gil, William D. Hinsberg, Carl E. Larson, Linda Karin Sundberg +1 more | 2010-12-21 |
| 7824845 | Functionalized carbosilane polymers and photoresist compositions containing the same | Matthew E. Colburn, Daniel P. Sanders, Ratnam Sooriyakumaran, Hoa D. Truong | 2010-11-02 |
| 7820369 | Method for patterning a low activation energy photoresist | Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Ratnam Sooriyakumaran, Hoa D. Truong +1 more | 2010-10-26 |
| 7759044 | Low activation energy dissolution modification agents for photoresist applications | Phillip Brock, Richard Anthony DiPietro, Ratnam Sooriyakumaran, Hoa D. Truong | 2010-07-20 |
| 7749422 | Release layer for imprinted photocationic curable resins | Mark Whitney Hart, Frances Anne Houle, Hiroshi Ito | 2010-07-06 |
| 7709370 | Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structures | Phillip Brock, Blake Davis, Wu-Song Huang, Qinghuang Lin, Alshakim Nelson +2 more | 2010-05-04 |
| 7678537 | Graded topcoat materials for immersion lithography | Phillip Brock, Daniel P. Sanders, Linda Karin Sundberg | 2010-03-16 |
| 7563558 | Negative resists based on acid-catalyzed elimination of polar molecules | Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, David R. Medeiros, Ratnam Sooriyakumaran | 2009-07-21 |
| 7550254 | Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions | Ratnam Sooriyakumaran, Debra Fenzel-Alexander | 2009-06-23 |
| 7476492 | Low activation energy photoresist composition and process for its use | Richard Anthony DiPietro, Ratnam Sooriyakumaran, Hoa D. Truong | 2009-01-13 |
| 7468330 | Imprint process using polyhedral oligomeric silsesquioxane based imprint materials | Richard Anthony DiPietro, Geraud Jean-Michel Dubois, Mark Whitney Hart, Robert D. Miller, Ratnam Sooriyakumaran | 2008-12-23 |
| 7399581 | Photoresist topcoat for a photolithographic process | Ratnam Sooriyakumaran, Linda Karin Sundberg | 2008-07-15 |
| 7393624 | Negative resists based on acid-catalyzed elimination of polar molecules | Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, David R. Medeiros, Ratnam Sooriyakumaran | 2008-07-01 |
| 7358029 | Low activation energy dissolution modification agents for photoresist applications | Phillip Brock, Richard Anthony DiPietro, Ratnam Sooriyakumaran, Hoa D. Truong | 2008-04-15 |
| 7300739 | Negative resists based on a acid-catalyzed elimination of polar molecules | Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, David R. Medeiros, Ratnam Sooriyakumaran | 2007-11-27 |
| 7288362 | Immersion topcoat materials with improved performance | Phillip Brock, Dario Gil, William D. Hinsberg, Carl E. Larson, Linda Karin Sundberg +1 more | 2007-10-30 |
| 7261992 | Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions | Ratnam Sooriyakumaran, Debra Fenzel-Alexander | 2007-08-28 |