RA

Robert David Allen

IBM: 102 patents #541 of 70,183Top 1%
TA Taclov: 4 patents #2 of 4Top 50%
SC Sumitomo Bakelite Co.: 4 patents #87 of 790Top 15%
ST Siga Technologies: 3 patents #19 of 32Top 60%
BG B. F. Goodrich: 3 patents #166 of 734Top 25%
Motorola: 2 patents #4,475 of 12,470Top 40%
CL Central Glass Company, Limited: 2 patents #334 of 968Top 35%
Globalfoundries: 2 patents #1,397 of 4,424Top 35%
AE Alliance For Sustainable Energy: 2 patents #186 of 746Top 25%
S( Subsea 7 (Us): 1 patents #6 of 12Top 50%
JS Jsr: 1 patents #649 of 1,137Top 60%
📍 Golden, CO: #1 of 1,256 inventorsTop 1%
🗺 Colorado: #61 of 40,980 inventorsTop 1%
Overall (All Time): #10,763 of 4,157,543Top 1%
115
Patents All Time

Issued Patents All Time

Showing 26–50 of 115 patents

Patent #TitleCo-InventorsDate
9504967 Composite membrane with multi-layered active layer Young-Hye Na, Ratnam Sooriyakumaran 2016-11-29
9324601 Low temperature adhesive resins for wafer bonding Paul S. Andry, Jeffrey D. Gelorme, Li-Wen Hung, John U. Knickerbocker, Cornelia K. Tsang 2016-04-26
9255194 Methods and materials for depolymerizing polyesters Krishna Bajjuri, James L. Hedrick, Gregory Breyta, Carl E. Larson 2016-02-09
9235124 Planarization over topography with molecular glass materials Mark Whitney Hart, Ratnam Sooriyakumaran 2016-01-12
9233087 Inhibitors and methods of inhibiting bacterial and viral pathogens Sean M. Amberg, Dongcheng Dai, James R. Burgeson, Dennis E. Hruby 2016-01-12
9057951 Chemically amplified photoresist composition and process for its use Phillip Brock, Richard Anthony DiPietro, Hoa D. Truong 2015-06-16
9012587 Photo-patternable dielectric materials and formulations and methods of use Phillip Brock, Blake Davis, Qinghuang Lin, Robert D. Miller, Alshakim Nelson +1 more 2015-04-21
8951599 Wound dressing Christopher E. Bannister, Jere J. Brophy, Richard Anthony DiPietro 2015-02-10
8900802 Positive tone organic solvent developed chemically amplified resist Ramakrishnan Ayothi, Luisa D. Bozano, William D. Hinsberg, Linda Karin Sundberg, Sally A. Swanson +2 more 2014-12-02
8857629 Composite membrane with multi-layered active layer Young-Hye Na, Ratnam Sooriyakumaran 2014-10-14
8802347 Silicon containing coating compositions and methods of use Phillip Brock, Kuang-Jung Chen, Alexander Friz, Wu-Song Huang, Ratnam Sooriyakumaran +2 more 2014-08-12
8754139 Polyamide membranes with fluoroalcohol functionality Na Young-Hye, Ratnam Sooriyakumaran, Masaki Fujiwara, Kazuhiro Yamanaka 2014-06-17
8652762 Organic graded spin on BARC compositions for high NA lithography Dario L. Goldfarb, Libor Vyklicky, Sean D. Burns, David R. Medeiros, Daniel P. Sanders 2014-02-18
8603584 Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materials Richard Anthony DiPietro, Geraud Jean-Michel Dubois, Mark Whitney Hart, Robert D. Miller, Ratnam Sooriyakumaran 2013-12-10
8470516 Method of forming a relief pattern by e-beam lithography using chemical amplification, and derived articles Luisa D. Bozano, Phillip Brock, Qinghuang Lin, Alshakim Nelson, Ratnam Sooriyakumaran 2013-06-25
8440387 Graded topcoat materials for immersion lithography Phillip Brock, Daniel P. Sanders, Linda Karin Sundberg 2013-05-14
8431670 Photo-patternable dielectric materials and formulations and methods of use Phillip Brock, Blake Davis, Qinghuang Lin, Robert D. Miller, Alshakim Nelson +1 more 2013-04-30
8377631 Planarization over topography with molecular glass materials Mark Whitney Hart, Ratnam Sooriyakumaran 2013-02-19
8353410 Polymeric films made from polyhedral oligomeric silsesquioxane (POSS) and a hydrophilic comonomer Young-Hye Na, Ratnam Sooriyakumaran 2013-01-15
8334088 Functionalized carbosilane polymers and photoresist compositions containing the same Matthew E. Colburn, Daniel P. Sanders, Ratnam Sooriyakumaran, Hoa D. Truong 2012-12-18
8168366 Low activation energy photoresist composition and process for its use Richard Anthony DiPietro, Ratnam Sooriyakumaran, Hoa D. Truong 2012-05-01
8137874 Organic graded spin on BARC compositions for high NA lithography Dario L. Goldfarb, Libor Vyklicky, Sean D. Burns, David R. Medeiros, Daniel P. Sanders 2012-03-20
8034532 High contact angle topcoat material and use thereof in lithography process Phillip Brock, Carl E. Larson, Ratnam Sooriyakumaran, Linda Karin Sundberg, Hoa D. Truong 2011-10-11
8029971 Photopatternable dielectric materials for BEOL applications and methods for use Phillip Brock, Blake Davis, Qinghuang Lin, Robert D. Miller, Alshakim Nelson +1 more 2011-10-04
8026293 Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materials Richard Anthony DiPietro, Geraud Jean-Michel Dubois, Mark Whitney Hart, Robert D. Miller, Ratnam Sooriyakumaran 2011-09-27