Issued Patents All Time
Showing 476–500 of 548 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9768276 | Method and structure of forming FinFET electrical fuse structure | Hong He, Chih-Chao Yang, Yunpeng Yin | 2017-09-19 |
| 9761450 | Forming a fin cut in a hardmask | Zhenxing Bi, Kangguo Cheng, Peng Xu | 2017-09-12 |
| 9761717 | Stress memorization technique for strain coupling enhancement in bulk finFET device | Kangguo Cheng, Chun-Chen Yeh | 2017-09-12 |
| 9755073 | Fabrication of vertical field effect transistor structure with strained channels | Kangguo Cheng | 2017-09-05 |
| 9748245 | Multiple finFET formation with epitaxy separation | Kangguo Cheng, Peng Xu | 2017-08-29 |
| 9741856 | Stress retention in fins of fin field-effect transistors | Sivananda K. Kanakasabapathy, Gauri Karve, Fee Li Lie, Stuart A. Sieg, John R. Sporre | 2017-08-22 |
| 9741577 | Metal reflow for middle of line contacts | Junli Wang, Chih-Chao Yang | 2017-08-22 |
| 9735253 | Closely packed vertical transistors with reduced contact resistance | Zhenxing Bi, Kangguo Cheng, Peng Xu | 2017-08-15 |
| 9735234 | Stacked nanowire devices | Kangguo Cheng, Ramachandra Divakaruni | 2017-08-15 |
| 9735155 | Bulk silicon germanium FinFET | Kangguo Cheng, Shogo Mochizuki | 2017-08-15 |
| 9735269 | Integrated strained stacked nanosheet FET | Kangguo Cheng, Ramachandra Divakaruni, Xin Miao | 2017-08-15 |
| 9728621 | iFinFET | Kangguo Cheng, Geng Wang, Qintao Zhang | 2017-08-08 |
| 9721885 | Electrical fuse and/or resistor structures | Veeraraghavan S. Basker, Kangguo Cheng, Ali Khakifirooz | 2017-08-01 |
| 9716045 | Directly forming SiGe fins on oxide | Kangguo Cheng, Hong He, Junli Wang | 2017-07-25 |
| 9716046 | Method and structure for forming dielectric isolated finFET with improved source/drain epitaxy | Kangguo Cheng | 2017-07-25 |
| 9716064 | Electrical fuse and/or resistor structures | Veeraraghavan S. Basker, Kangguo Cheng, Ali Khakifirooz | 2017-07-25 |
| 9716142 | Stacked nanowires | Zhenxing Bi, Kangguo Cheng, Xin Miao | 2017-07-25 |
| 9716038 | Critical dimension shrink through selective metal growth on metal hardmask sidewalls | Hsueh-Chung Chen, Hong He, Chih-Chao Yang, Yunpeng Yin | 2017-07-25 |
| 9711503 | Gate structures with protected end surfaces to eliminate or reduce unwanted EPI material growth | Ruilong Xie, Shom Ponoth | 2017-07-18 |
| 9698098 | Anti-fuse structure and method for manufacturing the same | Hong He, Junli Wang, Chih-Chao Yang | 2017-07-04 |
| 9691656 | Self-forming embedded diffusion barriers | Cyril Cabral, Jr., Daniel C. Edelstein, Takeshi Nogami | 2017-06-27 |
| 9666527 | Middle of the line integrated eFuse in trench EPI structure | Hong He, Junli Wang, Chih-Chao Yang | 2017-05-30 |
| 9660077 | Stress memorization technique for strain coupling enhancement in bulk finFET device | Kangguo Cheng, Chun-Chen Yeh | 2017-05-23 |
| 9659960 | Extremely thin silicon-on-insulator silicon germanium device without edge strain relaxation | Kangguo Cheng, Zuoguang Liu, Xin Miao | 2017-05-23 |
| 9653480 | Nanosheet capacitor | Kangguo Cheng, Geng Wang, Qintao Zhang | 2017-05-16 |